Inventor
Kaveri Jain
Inventor
Boise, ID, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
H01LSemiconductor devices16%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1016%
H10DInorganic electric semiconductor devices11%
Y10TTechnical subjects covered by former us classification7%
H10BElectronic memory devices5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
C08LCompositions of macromolecular compounds3%
PatentTitleYear
10,600,681Methods of forming staircase structures202010,522,461Semiconductor device structures201910,147,638Methods of forming staircase structures201810,049,874Self-assembled nanostructures including metal oxides and semiconductor structures comprised thereof201810,032,719Semiconductor device structures20189,666,531'Semiconductor device structures'20179,418,848'Methods of forming patterns with a mask formed utilizing a brush layer'20169,396,996'Methods of forming openings in semiconductor structures'20169,291,907'Methods for forming resist features and arrays of aligned, elongate resist features'20169,235,134'Lens heating compensation in photolithography'20169,209,039'Methods of forming a reversed pattern in a substrate, and related semiconductor device structures'20159,184,058'Methods of forming patterns by using a brush layer and masks'20159,177,795'Methods of forming nanostructures including metal oxides'20159,142,504'Semiconductor device structures'20159,140,977'Imaging devices, methods of forming same, and methods of forming semiconductor device structures'20158,883,372'Reticle with composite polarizer and method of simultaneous optimization of imaging of a set of different patterns'20148,845,908'Reticles, and methods of mitigating asymmetric lens heating in photolithography'20148,815,752'Methods of forming features in semiconductor device structures'20148,815,497'Semiconductor constructions and methods of forming patterns'20148,758,987'Methods of forming a reversed pattern in a substrate'20148,736,814'Lithography wave-front control system and method'20148,728,721'Methods of processing substrates'20148,625,078'Illumination design for lens heating mitigation'20148,507,191'Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same'20138,486,611'Semiconductor constructions and methods of forming patterns'20138,440,371'Imaging devices, methods of forming same, and methods of forming semiconductor device structures'20137,226,957'Method for producing polymers with controlled molecular weight and end group functionality using photopolymerization in microemulsions'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007Based in Iowa City, IA, US· patent location history
2013–2020Patents assigned to MICRON TECHNOLOGY INC (24)· patent assignee history
2013–2016Patents assigned to JAIN KAVERI (11)· patent assignee history
2013–2016Patents assigned to ZHANG ZISHU (9)· patent assignee history
2013–2016Patents assigned to ZHOU JIANMING (9)· patent assignee history
2013–2016Patents assigned to GOU LIJING (8)· patent assignee history
2013–2020Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 24 | 2013–2020 |
| JAIN KAVERIself | 11 | 2013–2016 |
| ZHANG ZISHU | 9 | 2013–2016 |
| ZHOU JIANMING | 9 | 2013–2016 |
| GOU LIJING | 8 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 26 | 2013–2020 |
| Iowa City, IA, US | 1 | 2007 |