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Inventor

MENG LIN CHANG

Inventor
TW

Overview

2→
Patents
2023–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
G06FElectric digital data processing17%
H01LSemiconductor devices17%
H10DInorganic electric semiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
PatentTitleYear
12,271,116Method of measuring mask overlay using test patterns202511,762,302Integrated circuit overlay test patterns and method thereof2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2023–2025Based in TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD22023–2025
Locations
LocationPatentsSpan
TW22023–2025