Inventor

Takahisa Namiki

Inventor

Kawasaki, JP

Overview

1993–2013

Patent span

Physics

Primary field (CPC G)

Patents· 39 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%

G11BInformation storage based on relative movement between record carrier and transducer9%

H10BElectronic memory devices7%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%

H10DInorganic electric semiconductor devices5%

H05KPrinted circuits2%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients1%

C09DCoating compositions, e.g. paints, varnishes or lacquers1%

PatentTitleYear

8,349,542'Manufacturing process of semiconductor device'2013 8,334,091'Resist pattern swelling material, and method for patterning using same'2012 8,198,009'Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same'2012 8,198,014'Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same'2012 7,820,367'Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same'2010 7,799,508'Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same'2010 7,744,768'Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof'2010 7,642,650'Semiconductor device having a pillar structure'2010 7,585,610'Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same'2009 7,550,248'Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same'2009 7,452,657'Resist composition, method of forming resist pattern, semiconductor device and method of manufacturing thereof'2008 7,364,829'Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device'2008 7,361,448'Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same'2008 7,338,750'Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof'2008 7,202,289'Biodegradable resin composition, filler therefor and molded article thereof'2007 7,189,783'Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof'2007 6,794,112'Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices'2004 6,794,113'Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices'2004 6,787,288'Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices'2004 6,773,867'Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices'2004 6,605,414'Method for manufacturing magnetoresistance head'2003 6,582,878'Chemical amplification resist compositions and process for the formation of resist patterns'2003 6,506,534'Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices'2003 6,465,137'Resist composition and pattern forming process'2002 6,329,125'Chemically amplified resist compositions and process for the formation of resist patterns'2001 6,200,725'Chemically amplified resist compositions and process for the formation of resist patterns'2001 6,200,724'Chemical amplification resist compositions and process for the formation of resist patterns'2001 6,052,261'Method for manufacturing magnetoresistance head'2000 6,013,416'Chemically amplified resist compositions and process for the formation of resist patterns'2000 5,968,713'Chemically amplified resist compositions and process for the formation of resist patterns'1999 5,962,191'Resist compositions for forming resist patterns'1999 5,910,392'Resist composition, a process for forming a resist pattern and a process for manufacturing a semiconductor device'1999 5,824,452'Resist compositions and process for the formation of resist patterns'1998 5,804,354'Composition for forming conductivity imparting agent and pattern forming method'1998 5,776,659'Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer'1998 5,633,121'Method for examining surface of copper layer in circuit board and process for producing circuit board'1997 5,484,687'Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof'1996 5,482,174'Method for removing copper oxide on the surface of a copper film and a method for patterning a copper film'1996 5,240,813'Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2013Patents assigned to FUJITSU LTD (37)· patent assignee history

1993–1996Based in Atsugi, JP· patent location history

1996–2013Based in Kawasaki, JP· patent location history

2000–2003Based in Kanagawa, JP· patent location history

2012–2013Patents assigned to KOZAWA MIWA (4)· patent assignee history

2012–2013Patents assigned to NAMIKI TAKAHISA (4)· patent assignee history

2012–2013Patents assigned to NOZAKI KOJI (4)· patent assignee history

2012–2013Patents assigned to KON JUNICHI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
FUJITSU LTD	37	1993–2013
KOZAWA MIWA	4	2012–2013
NAMIKI TAKAHISAself	4	2012–2013
NOZAKI KOJI	4	2012–2013
KON JUNICHI	2	2012–2013

Locations

Location	Patents	Span
Kawasaki, JP	35	1996–2013
Kanagawa, JP	2	2000–2003
Atsugi, JP	2	1993–1996