Inventor
Leonard E. Klebanoff
Inventor
Dublin, CA, US
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
B08BCleaning in general8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H01JElectric discharge tubes or discharge lamps7%
B82YSpecific uses or applications of nanostructures6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors3%
G01FMeasuring volume, volume flow, mass flow or liquid level3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
PatentTitleYear
10,000,377Nanostructured metal amides and nitrides for hydrogen storage20189,759,912'Particle and chemical control using tunnel flow'20179,389,180'Methods and apparatus for use with extreme ultraviolet light having contamination protection'20169,244,368'Particle control near reticle and optics using showerhead'20169,156,068'Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation'20158,439,534'Mobile lighting apparatus'20137,740,916'Method for the protection of extreme ultraviolet lithography optics'20107,473,301'Adhesive particle shielding'20097,147,722'Method for in-situ cleaning of carbon contaminated surfaces'20066,989,629'Method and apparatus for debris mitigation for an electrical discharge source'20066,888,297'Method and apparatus for debris mitigation for an electrical discharge source'20056,772,776'Apparatus for in situ cleaning of carbon contaminated surfaces'20046,664,554'Self-cleaning optic for extreme ultraviolet lithography'20036,549,264'Extreme-UV lithography vacuum chamber zone seal'20036,545,745'Extreme-UV lithography vacuum chamber zone seal'20036,533,952'Mitigation of radiation induced surface contamination'20036,492,067'Removable pellicle for lithographic mask protection and handling'20026,333,775'Extreme-UV lithography vacuum chamber zone seal'20016,279,601'Liquid zone seal'20016,253,464'Method for protection of lithographic components from particle contamination'20016,232,578'Thermophoretic vacuum wand'20016,231,930'Process for producing radiation-induced self-terminating protective coatings on a substrate'20016,192,897'Apparatus and method for in-situ cleaning of resist outgassing windows'20016,169,652'Electrostatically screened, voltage-controlled electrostatic chuck'20016,153,044'Protection of lithographic components from particle contamination'20006,072,157'Thermophoretic vacuum wand'20004,197,992'Thermostat control device'19804,083,038'Condenser plate assembly'19784,002,996'Level detector using oscillator circuit with two capacitive probes'19773,986,292'Insect killing device'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976Based in Agincourt, CA· patent location history
1977–1978Patents assigned to ELKAY ELECTRONICS LTD (2)· patent assignee history
1977–1980Based in Willowdale, CA· patent location history
2000–2010Patents assigned to EUV LLC (19)· patent assignee history
2000–2003Based in San Ramon, CA, US· patent location history
2001–2018Based in Dublin, CA, US· patent location history
2005–2010Based in San Clemente, CA, US· patent location history
2015–2017Patents assigned to KLA TENCOR CORP (4)· patent assignee history
2015–2017Patents assigned to SANDIA CORP (4)· patent assignee history
2016Patents assigned to CHILESE FRANK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EUV LLC | 19 | 2000–2010 |
| KLA TENCOR CORP | 4 | 2015–2017 |
| SANDIA CORP | 4 | 2015–2017 |
| ELKAY ELECTRONICS LTD | 2 | 1977–1978 |
| CHILESE FRANK | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Dublin, California, US | 14 | 2001–2018 |
| San Ramon, California, US | 9 | 2000–2003 |
| San Clemente, California, US | 3 | 2005–2010 |
| Willowdale, CA | 3 | 1977–1980 |
| Agincourt, CA | 1 | 1976 |