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Inventor

Michitaka Ootani

Inventor
Kawagoe, JP

Overview

28→
Patents
2002–2013
Patent span
Chemistry
Primary field (CPC C)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C07CAcyclic or carbocyclic compounds11%
C07DHeterocyclic compounds5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
C09JAdhesives2%
PatentTitleYear
8,450,520'Process for preparation of 2-fluoroacrylic esters'20138,115,036'Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern'20127,736,835'Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern'20107,666,967'Ester compound, polymer, resist composition, and patterning process'20107,569,323'Resist protective coating material and patterning process'20097,488,567'Polymer, resist composition and patterning process'20097,402,626'Top coat composition'20087,378,218'Polymer, resist composition and patterning process'20087,354,693'Polymer, resist protective coating material, and patterning process'20087,276,623'Polymerizable ester compounds'20077,169,869'Polymers, resist compositions and patterning process'20077,005,228'Polymers, resist compositions and patterning process'20066,946,235'Polymers, resist compositions and patterning process'20056,933,095'Polymers, resist compositions and patterning process'20056,916,592'Esters, polymers, resist compositions and patterning process'20056,872,514'Polymers, resist compositions and patterning process'20056,864,037'Polymers, resist compositions and patterning process'20056,861,197'Polymers, resist compositions and patterning process'20056,855,477'Chemically amplified resist compositions and patterning process'20056,824,955'Polymers, resist compositions and patterning process'20046,790,586'Resist compositions and patterning process'20046,723,485'Positive resist composition and process for forming resist pattern using same'20046,710,148'Polymers, resist compositions and patterning process'20046,680,389'Ester compounds'20046,603,037'Ester compounds'20036,582,880'Polymers, resist compositions and patterning process'20036,511,787'Polymers, resist compositions and patterning process'20036,414,167'Octafluorotricyclodecane derivatives and processes for producing same'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2013Patents assigned to CENTRAL GLASS CO LTD (28)· patent assignee history
2002–2008Based in Saitama, JP· patent location history
2003–2010Patents assigned to SHINETSU CHEMICAL CO (15)· patent assignee history
2003–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (11)· patent assignee history
2003–2013Based in Kawagoe, JP· patent location history
2003–2007Based in Tokyo, JP· patent location history
2009–2010Patents assigned to PANASONIC CORP (3)· patent assignee history
2012–2013Patents assigned to OOTANI MICHITAKA (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CENTRAL GLASS CO LTD282002–2013
SHINETSU CHEMICAL CO152003–2010
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD112003–2008
PANASONIC CORP32009–2010
OOTANI MICHITAKAself22012–2013
Locations
LocationPatentsSpan
Kawagoe, JP152003–2013
Saitama, JP72002–2008
Tokyo, JP62003–2007