Inventor
DAVID L. O'MEARA
Inventor
US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
H10DInorganic electric semiconductor devices11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
PatentTitleYear
12,598,932Methods and structures for improving etch profile of underlying layers202612,451,354Double patterning method of patterning a substrate202512,400,872Sacrificial capping layer for gate protection202511,567,407Method for globally adjusting spacer critical dimension using photo-active self-assembled monolayer202311,532,517Localized etch stop layer202211,417,526Multiple patterning processes2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2022–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 6 | 2022–2026 |