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Inventor

Osamu Shitamura

Inventor
Katsuta, JP

Overview

3→
Patents
1991–2001
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material22%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests22%
B21BRolling of metal11%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form11%
C21DModifying the physical structure of ferrous metals11%
F16CShafts11%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
6,315,830'Molten metal plating apparatus'20015,081,760'Work roll for metal rolling'19925,072,689'Continuous hot-dip plating apparatus'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2001Patents assigned to HITACHI LTD (3)· patent assignee history
1991–1992Based in Katsuta, JP· patent location history
2001Based in Hitachinaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD31991–2001
Locations
LocationPatentsSpan
Katsuta, JP21991–1992
Hitachinaka, JP12001