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Inventor

GUOHAO WANG

Inventor
CN

Overview

2→
Patents
2023–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions20%
C23FNon-mechanical removal of metallic material from surface20%
H01LSemiconductor devices20%
H03HImpedance networks, e.g. resonant circuits20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
12,323,126Laterally excited bulk wave resonator and fabricating method thereof202511,746,257Chemical mechanical polishing solution2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to ANJI MICROELECTRONICS SHANGHAI CO LTD (1)· patent assignee history
2023–2025Based in CN· patent location history
2025Patents assigned to HANGZHOU SAPPLAND MICROELECTRONICS TECH CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ANJI MICROELECTRONICS SHANGHAI CO LTD12023
HANGZHOU SAPPLAND MICROELECTRONICS TECH CO LTD12025
Locations
LocationPatentsSpan
CN22023–2025