Inventor
Sergio Fukuda Shoji
Inventor
San Jose, CA, US
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01LSemiconductor devices18%
G05BControl or regulating systems in general6%
H05HPlasma technique6%
C23CCoating metallic material4%
C23FNon-mechanical removal of metallic material from surface3%
G05DSystems for controlling or regulating non-electric variables3%
Y10TTechnical subjects covered by former us classification3%
F15DFluid dynamics, i.e. methods or means for influencing the flow of gases or liquids1%
PatentTitleYear
10,930,540Electrostatic chuck assembly having a dielectric filler202110,854,427Radio frequency (RF) pulsing impedance tuning with multiplier mode202010,854,425Feedforward temperature control for plasma processing apparatus202010,784,132Method and apparatus for de-chucking a workpiece using a swing voltage sequence202010,745,807Showerhead with reduced backside plasma ignition202010,546,731Method, apparatus and system for wafer dechucking using dynamic voltage sweeping202010,504,765Electrostatic chuck assembly having a dielectric filler201910,490,429Substrate carrier using a proportional thermal fluid delivery system201910,468,233RF power delivery regulation for processing substrates201910,378,108Showerhead with reduced backside plasma ignition201910,242,893Method and apparatus for de-chucking a workpiece using a swing voltage sequence20199,909,213'Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors'20189,788,405'RF power delivery with approximated saw tooth wave pulsing'20179,741,539'RF power delivery regulation for processing substrates'20179,639,097'Component temperature control by coolant flow control and heater duty cycle control'20179,338,871'Feedforward temperature control for plasma processing apparatus'20169,269,587'Methods for etching materials using synchronized RF pulses'20168,962,488'Synchronized radio frequency pulsing for plasma etching'20158,880,227'Component temperature control by coolant flow control and heater duty cycle control'20148,513,889'Methods and apparatus for tuning matching networks'20138,404,598'Synchronized radio frequency pulsing for plasma etching'20136,898,065'Method and apparatus for operating an electrostatic chuck in a semiconductor substrate processing system'20055,721,737'Serial transmission system for controlling a network of I/O devices'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2021Based in San Jose, CA, US· patent location history
2013–2021Patents assigned to APPLIED MATERIALS INC (21)· patent assignee history
2013–2016Patents assigned to RAMASWAMY KARTIK (4)· patent assignee history
2013–2014Patents assigned to LIAO BRYAN (3)· patent assignee history
2013–2016Patents assigned to NGUYEN DUY D (3)· patent assignee history
2014–2016Patents assigned to MAHADESWARASWAMY CHETAN (2)· patent assignee history
2020Based in Sunnyvale, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 21 | 2013–2021 |
| RAMASWAMY KARTIK | 4 | 2013–2016 |
| LIAO BRYAN | 3 | 2013–2014 |
| NGUYEN DUY D | 3 | 2013–2016 |
| MAHADESWARASWAMY CHETAN | 2 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 22 | 1998–2021 |
| Sunnyvale, California, US | 1 | 2020 |