Inventor
Paul Deaton
Inventor
San Jose, CA, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
C30BSingle-crystal growth10%
Y10TTechnical subjects covered by former us classification10%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
H01LSemiconductor devices3%
H10DInorganic electric semiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
Y02TClimate change mitigation technologies related to transportation3%
PatentTitleYear
9,829,805Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor20179,632,411'Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor'20179,236,467'Atomic layer deposition of hafnium or zirconium alloy films'20168,536,068'Atomic layer deposition of photoresist materials and hard mask precursors'20138,465,903'Radiation patternable CVD film'20137,794,544'Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system'20107,775,508'Ampoule for liquid draw and vapor draw with a continuous level sensor'20106,133,152'Co-rotating edge ring extension for use in a semiconductor processing chamber'20006,123,766'Method and apparatus for achieving temperature uniformity of a substrate'20006,048,403'Multi-ledge substrate support for a thermal processing chamber'20006,035,100'Reflector cover for a semiconductor processing chamber'20005,960,555'Method and apparatus for purging the back side of a substrate during chemical vapor processing'19995,322,567'Particulate reduction baffle with wafer catcher for chemical-vapor-deposition apparatus'19945,178,681'Suspension system for semiconductor reactors'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2017Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
1993Based in Milpitas, CA, US· patent location history
1994Based in Sunnyvale, CA, US· patent location history
1999–2017Based in San Jose, CA, US· patent location history
2013Patents assigned to DEATON PAUL (2)· patent assignee history
2013Patents assigned to MICHAELSON TIMOTHY (2)· patent assignee history
2013Patents assigned to WEIDMAN TIMOTHY W (2)· patent assignee history
2013Patents assigned to CHATTERJEE AMIT (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 14 | 1993–2017 |
| DEATON PAULself | 2 | 2013 |
| MICHAELSON TIMOTHY | 2 | 2013 |
| WEIDMAN TIMOTHY W | 2 | 2013 |
| CHATTERJEE AMIT | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 12 | 1999–2017 |
| Sunnyvale, California, US | 1 | 1994 |
| Milpitas, California, US | 1 | 1993 |