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Inventor

Masayuki Nagasawa

Inventor
Kawagoe, JP

Overview

12→
Patents
1998–2018
Patent span
Chemistry
Primary field (CPC C)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
B24BMachines, devices, or processes for grinding or polishing11%
C09GPolishing compositions11%
C23FNon-mechanical removal of metallic material from surface7%
G21CNuclear reactors7%
G21DNuclear power plant7%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
F01KSteam engine plants4%
F16JPistons4%
PatentTitleYear
10,160,895Coolant composition, method of operating internal combustion engine using the same, and use of the same20189,896,768'Sealing member and method of manufacturing the same'20187,970,094'Nuclear power plant and operation method thereof'20117,333,584'Nuclear power plant and operation method thereof'20087,059,132'Steam generator feedwater control system for power plant'20067,026,245'Polishing agent and polishing method'20066,777,337'Planarizing method of semiconductor wafer and apparatus thereof'20046,663,468'Method for polishing surface of semiconductor device substrate'20036,589,871'Processing method, measuring method and producing method of semiconductor devices'20036,565,424'Method and apparatus for planarizing semiconductor device'20036,043,155'Polishing agent and polishing method'20005,772,780'Polishing agent and polishing method'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2006Patents assigned to HITACHI LTD (6)· patent assignee history
1998–2006Based in Kawagoe, JP· patent location history
2004–2006Patents assigned to RENESAS TECH CORP (2)· patent assignee history
2008–2011Patents assigned to HITACHI GE NUCLEAR ENERGY LTD (2)· patent assignee history
2008Based in Tokyo, JP· patent location history
2011Based in Chiyoda-ku, JP· patent location history
2018Patents assigned to HORIBA STEC CO LTD (1)· patent assignee history
2018Patents assigned to JAPAN CHEMICAL IND CO LTD (1)· patent assignee history
2018Based in Shizuoka, JP· patent location history
2018Based in Kyoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD61998–2006
HITACHI GE NUCLEAR ENERGY LTD22008–2011
RENESAS TECH CORP22004–2006
HORIBA STEC CO LTD12018
JAPAN CHEMICAL IND CO LTD12018
Locations
LocationPatentsSpan
Kawagoe, JP71998–2006
Shizuoka, JP12018
Kyoto, JP12018
Chiyoda-ku, JP12011
Tokyo, JP12008