Inventor
Norman L. Tam
Inventor
Cupertino, CA, US
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
H01LSemiconductor devices24%
H10DInorganic electric semiconductor devices8%
C23CCoating metallic material6%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace5%
H05BElectric heating5%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
G05DSystems for controlling or regulating non-electric variables3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
H01JElectric discharge tubes or discharge lamps2%
PatentTitleYear
10,948,353Thermal processing chamber with low temperature control202110,770,272Plasma-enhanced anneal chamber for wafer outgassing202010,571,337Thermal cooling member with low temperature control202010,373,859Support ring with masked edge201910,128,144Support cylinder for thermal processing chamber201810,109,514Visual feedback for process control in RTP chambers201810,056,286Support ring with masked edge20189,842,759'Support ring with masked edge'20179,735,034'Visual feedback for process control in RTP chambers'20179,659,809'Support cylinder for thermal processing chamber'20179,552,989'Apparatus and method for improved control of heating and cooling of substrates'20179,514,969'Apparatus for reducing the effect of contamination on a rapid thermal process'20169,385,004'Support cylinder for thermal processing chamber'20169,330,955'Support ring with masked edge'20169,117,661'Method of improving oxide growth rate of selective oxidation processes'20158,888,916'Thermal reactor with improved gas flow distribution'20148,608,853'Thermal reactor with improved gas flow distribution'20138,546,271'Method of improving oxide growth rate of selective oxidation processes'20138,548,311'Apparatus and method for improved control of heating and cooling of substrates'20138,207,044'Methods for oxidation of a semiconductor device'20128,056,500'Thermal reactor with improved gas flow distribution'20117,951,728'Method of improving oxide growth rate of selective oxidation processes'20117,947,561'Methods for oxidation of a semiconductor device'20117,509,035'Lamp array for thermal processing exhibiting improved radial uniformity'20096,828,234'RTP process chamber pressure control'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2021Patents assigned to APPLIED MATERIALS INC (25)· patent assignee history
2004Based in Sunnyvale, CA, US· patent location history
2009–2017Based in San Jose, CA, US· patent location history
2011–2013Patents assigned to TAM NORMAN (4)· patent assignee history
2011–2013Patents assigned to YOKOTA YOSHITAKA (4)· patent assignee history
2011–2013Patents assigned to BEHDJAT MEHRAN (2)· patent assignee history
2011–2013Patents assigned to LERNER ALEXANDER N (2)· patent assignee history
2016–2021Based in Cupertino, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 25 | 2004–2021 |
| TAM NORMANself | 4 | 2011–2013 |
| YOKOTA YOSHITAKA | 4 | 2011–2013 |
| BEHDJAT MEHRAN | 2 | 2011–2013 |
| LERNER ALEXANDER N | 2 | 2011–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Cupertino, California, US | 13 | 2016–2021 |
| San Jose, California, US | 11 | 2009–2017 |
| Sunnyvale, California, US | 1 | 2004 |