Inventor
Chung Hwan Kwon
Inventor
Kyungki-do, KR
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%
H10DInorganic electric semiconductor devices18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
C23CCoating metallic material9%
C30BSingle-crystal growth9%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace9%
PatentTitleYear
6,340,625'Method for simultaneously forming thinner and thicker parts of a dual oxide layer having varying thicknesses'20026,207,588'Method for simultaneously forming thinner and thicker parts of a dual oxide layer having varying thicknesses'20015,711,808'Boat for vertical diffusion furnace'19985,704,984'Chemical vapor deposition apparatus with a heat radiation structure'19985,616,025'Vertical diffusion furnace having improved gas flow'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2002Patents assigned to SAMSUNG ELECTRONICS CO LTD (5)· patent assignee history
1997–1998Based in Yongin, KR· patent location history
1998–2002Based in Kyungki-do, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 5 | 1997–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyungki-do, KR | 3 | 1998–2002 |
| Yongin, KR | 2 | 1997–1998 |