Inventor
Ming Lun Yu
Inventor
Fremont, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
H01JElectric discharge tubes or discharge lamps18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
C23CCoating metallic material6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
Y02PClimate change mitigation technologies in the production or processing of goods6%
B82YSpecific uses or applications of nanostructures4%
C23FNon-mechanical removal of metallic material from surface4%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
PatentTitleYear
9,406,829'Method of manufacturing a photovoltaic device'20169,383,316'Method of measuring vapor flux density'20169,177,877'Temperature-adjusted spectrometer'20158,734,536'Temperature-adjusted spectrometer'20148,646,408'Flux monitor'20148,472,021'Particle detector'20138,237,120'Transverse focusing action in hyperbolic field detectors'20128,052,885'Structural modification using electron beam activated chemical etch'20118,008,207'Use of ion implantation in chemical etching'20117,879,730'Etch selectivity enhancement in electron beam activated chemical etch'20117,828,622'Sharpening metal carbide emitters'20107,755,042'Auger electron spectrometer with applied magnetic field at target surface'20107,635,842'Method and instrument for chemical defect characterization in high vacuum'20097,417,233'Beam exposure correction system and method'20086,759,800'Diamond supported photocathodes for electron sources'20046,717,146'Tandem microchannel plate and solid state electron detector'20046,555,830'Suppression of emission noise for microcolumn applications in electron beam inspection'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2008Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2003–2016Based in Fremont, CA, US· patent location history
2009–2012Patents assigned to KLA TENCOR CORP (4)· patent assignee history
2012–2014Patents assigned to YU MING LUN (4)· patent assignee history
2013–2016Patents assigned to FIRST SOLAR INC (6)· patent assignee history
2013–2014Patents assigned to BECK MARKUS E (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FIRST SOLAR INC | 6 | 2013–2016 |
| APPLIED MATERIALS INC | 4 | 2003–2008 |
| KLA TENCOR CORP | 4 | 2009–2012 |
| YU MING LUNself | 4 | 2012–2014 |
| BECK MARKUS E | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fremont, California, US | 17 | 2003–2016 |