Inventor
Koenraad Remi André Maria Schreel
Inventor
Veldhoven, NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
PatentTitleYear
10,884,345Calibration method for a lithographic apparatus202110,627,729Calibration method for a lithographic apparatus20209,217,916'Lithographic apparatus and device manufacturing method'20158,263,296'Lithographic apparatus and device manufacturing method'20127,826,037'Radiation beam pulse trimming'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2021Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2010–2021Based in Veldhoven, NL· patent location history
2012–2015Patents assigned to HINNEN PAUL CHRISTIAAN (2)· patent assignee history
2012–2015Patents assigned to JUNGBLUT REINER MARIA (2)· patent assignee history
2012–2015Patents assigned to VAN DE KERKHOF MARCUS ADRIANUS (2)· patent assignee history
2012Patents assigned to SCHREEL KOENRAAD REMI ANDRE MARIA (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2010–2021 |
| HINNEN PAUL CHRISTIAAN | 2 | 2012–2015 |
| JUNGBLUT REINER MARIA | 2 | 2012–2015 |
| VAN DE KERKHOF MARCUS ADRIANUS | 2 | 2012–2015 |
| SCHREEL KOENRAAD REMI ANDRE MARIAself | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 5 | 2010–2021 |