Inventor
David Bessems
Inventor
Eindhoven, NL
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them10%
H01LSemiconductor devices8%
B01DSeparation5%
Y10TTechnical subjects covered by former us classification5%
B67DDispensing, delivering or transferring liquids, not otherwise provided for3%
F16LPipes3%
H05GX-ray technique3%
PatentTitleYear
10,859,919Fluid handling structure, a lithographic apparatus and a device manufacturing method202010,551,748Fluid handling structure, a lithographic apparatus and a device manufacturing method202010,451,980Substrate table, immersion lithographic apparatus and device manufacturing method201910,437,162Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system20199,625,828'Fluid handling structure, lithographic apparatus and device manufacturing method'20179,625,833'Substrate table, immersion lithographic apparatus and device manufacturing method'20179,625,829'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20179,618,835'Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure'20179,563,132'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20179,291,914'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20169,059,228'Substrate table, immersion lithographic apparatus and device manufacturing method'20158,836,912'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20148,508,712'Fluid handling structure, lithographic apparatus and device manufacturing method'20138,405,817'Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method'20138,394,572'Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus'20138,114,568'Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2017Patents assigned to BESSEMS DAVID (10)· patent assignee history
2012–2015Patents assigned to STAVENGA MARCO KOERT (4)· patent assignee history
2012–2020Based in Eindhoven, NL· patent location history
2013–2020Patents assigned to ASML NETHERLANDS BV (15)· patent assignee history
2013–2017Patents assigned to EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA (5)· patent assignee history
2014–2017Patents assigned to ROPS CORNELIUS MARIA (4)· patent assignee history
2019Based in San Diego, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 15 | 2013–2020 |
| BESSEMS DAVIDself | 10 | 2012–2017 |
| EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA | 5 | 2013–2017 |
| ROPS CORNELIUS MARIA | 4 | 2014–2017 |
| STAVENGA MARCO KOERT | 4 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 15 | 2012–2020 |
| San Diego, California, US | 1 | 2019 |