Inventor
Mitsumasa Koyanagi
Inventor
Sendai, JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices23%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
H10BElectronic memory devices8%
G11CStatic stores7%
H01LSemiconductor devices7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%
Y10TTechnical subjects covered by former us classification3%
A61BDiagnosis1%
PatentTitleYear
11,121,710Semiconductor device202110,553,455Method for aligning chip components relative to substrate by using liquid202010,483,240Semiconductor device and method for manufacturing the same201910,177,118Semiconductor device and method for manufacturing the same20199,449,948'Chip support substrate, chip support method, three-dimensional integrated circuit, assembly device, and fabrication method of three-dimensional integrated circuit'20168,722,460'Method and apparatus for fabricating integrated circuit device using self-organizing function'20148,349,652'Method and apparatus for manufacturing three-dimensional integrated circuit'20138,283,208'Method and apparatus for fabricating integrated circuit device using self-organizing function'20128,229,539'Brain probe and method for manufacturing same'20127,906,363'Method of fabricating semiconductor device having three-dimensional stacked structure'20117,820,515'Nonvolatile semiconductor memory element excellent in charge retention properties and process for producing the same'20107,550,802'Nonvolatile semiconductor memory device and manufacturing process of the same'20097,355,238'Nonvolatile semiconductor memory device having nanoparticles for charge retention'20087,326,642'Method of fabricating semiconductor device using low dielectric constant material film'20087,303,990'Nickel-silicon compound forming method, semiconductor device manufacturing method, and semiconductor device'20077,265,402'Solid-state image sensor including a microlens'20077,091,534'Semiconductor device using low dielectric constant material film and method of fabricating the same'20066,525,415'Three-dimensional semiconductor integrated circuit apparatus and manufacturing method therefor'20035,778,202'Ring bus multiprocessor system and processor boards for constituting the same'19985,237,528'Semiconductor memory'19935,214,496'Semiconductor memory'19935,021,842'Trench DRAM cell with different insulator thicknesses'19914,901,128'Semiconductor memory'19904,891,326'Semiconductor device and a process for manufacturing the same'19904,701,349'Semiconductor integrated circuit device and method of producing the same'19874,355,374'Semiconductor memory device'19824,151,607'Semiconductor memory device'19794,016,007'Method for fabricating a silicon device utilizing ion-implantation and selective oxidation'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1993Patents assigned to HITACHI LTD (9)· patent assignee history
1987–1991Based in Higashimurayama, JP· patent location history
1990–1993Based in Cupertino, CA, US· patent location history
1998–2020Based in Sendai, JP· patent location history
2003–2014Patents assigned to KOYANAGI MITSUMASA (5)· patent assignee history
2003–2007Based in Natori, JP· patent location history
2006–2011Patents assigned to ZYCUBE CO LTD (4)· patent assignee history
2008–2020Patents assigned to UNIV TOHOKU (8)· patent assignee history
2008–2010Patents assigned to ASAHI GLASS CO LTD (3)· patent assignee history
2008–2014Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 9 | 1977–1993 |
| UNIV TOHOKU | 8 | 2008–2020 |
| KOYANAGI MITSUMASAself | 5 | 2003–2014 |
| ZYCUBE CO LTD | 4 | 2006–2011 |
| ASAHI GLASS CO LTD | 3 | 2008–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sendai, JP | 8 | 1998–2020 |
| Miyagi, JP | 5 | 2008–2014 |
| Natori, JP | 4 | 2003–2007 |
| Cupertino, California, US | 3 | 1990–1993 |
| Higashimurayama, JP | 3 | 1987–1991 |