Inventor
HIDEKI TAKAKUWA
Inventor
JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H01LSemiconductor devices18%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation18%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients9%
C08LCompositions of macromolecular compounds9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
PatentTitleYear
11,333,978Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing solid-state imaging element202211,156,754Curable composition, light-shielding film, color filter, pattern forming method, method for manufacturing color filter, solid-state imaging element, and infrared sensor2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2022Patents assigned to FUJIFILM CORP (2)· patent assignee history
2021–2022Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 2 | 2021–2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 2 | 2021–2022 |