Inventor

Paul Van Der Veen

Inventor
Waalre, NL

Overview

25→
Patents
2002–2019
Patent span
Physics
Primary field (CPC G)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G02BOptical elements, systems or apparatus7%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light7%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
H01LSemiconductor devices2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
10,222,703Lithographic apparatus and method20199,778,575'Lithographic apparatus and method'20179,645,510'Method of controlling a radiation source and lithographic apparatus comprising the radiation source'20179,250,536'Lithographic apparatus and method'20169,140,999'Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process'20158,982,319'Lithographic apparatus and method'20158,937,706'Lithographic apparatus and method'20158,885,144'Illumination system and lithographic apparatus'20148,625,199'Pulse modifier with adjustable etendue'20148,432,529'Lithographic apparatus and monitoring method'20138,004,770'Pulse modifier with adjustable etendue'20117,508,487'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20097,476,491'Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby'20097,368,732'Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program'20087,315,351'Lithographic apparatus, device manufacturing method and device manufactured therewith'20087,297,911'Lithographic apparatus, illumination system, illumination controller and control method'20077,283,208'Lithographic apparatus, method of manufacturing a device, and device manufactured thereby'20077,012,265'Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby'20066,989,544'Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program'20066,733,165'Optical integrator for an illumination device'20046,700,646'Lithographic apparatus, method of manufacturing a device, and device manufactured thereby'20046,583,855'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20036,538,716'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20036,473,163'Fluorescence radiation filter'20026,455,862'Lithographic projection apparatus'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2019Patents assigned to ASML NETHERLANDS BV (24)· patent assignee history
2002–2009Based in Eindhoven, NL· patent location history
2007–2019Based in Waalre, NL· patent location history
2011–2014Patents assigned to ASML HOLDING NV (2)· patent assignee history
2013–2016Patents assigned to VAN DER VEEN PAUL (7)· patent assignee history
2014–2016Patents assigned to MULDER HEINE MELLE (3)· patent assignee history
2015–2016Patents assigned to BASELMANS JOHANNES JACOBUS MATHEUS (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV242002–2019
VAN DER VEEN PAULself72013–2016
MULDER HEINE MELLE32014–2016
ASML HOLDING NV22011–2014
BASELMANS JOHANNES JACOBUS MATHEUS22015–2016
Locations
LocationPatentsSpan
Waalre, NL152007–2019
Eindhoven, NL102002–2009