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Inventor

Norio Kanai

Inventor
Kudamatsu, JP

Overview

5→
Patents
1981–1990
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01JElectric discharge tubes or discharge lamps20%
C30BSingle-crystal growth13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%
B23KSoldering or unsoldering7%
C23CCoating metallic material7%
PatentTitleYear
4,932,357'Vacuum apparatus'19904,824,309'Vacuum processing unit and apparatus'19894,810,473'Molecular beam epitaxy apparatus'19894,352,974'Plasma etcher having isotropic subchamber with gas outlet for producing uniform etching'19824,274,004'Ion implanter'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981–1990Patents assigned to HITACHI LTD (5)· patent assignee history
1981Based in Chofu, JP· patent location history
1982Based in Kodaira, JP· patent location history
1989–1990Based in Kudamatsu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD51981–1990
Locations
LocationPatentsSpan
Kudamatsu, JP31989–1990
Kodaira, JP11982
Chofu, JP11981