Inventor
Issei Ueda
Inventor
Kumamoto, JP
Overview
Patents· 50 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1047%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
H01LSemiconductor devices4%
G07CTime or attendance registers3%
G08GTraffic control systems3%
Y10TTechnical subjects covered by former us classification3%
B05CApparatus for applying fluent materials to surfaces, in general1%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients1%
G03DApparatus for processing exposed photographic materials1%
PatentTitleYear
9,666,463'Substrate processing apparatus'20179,373,531'Substrate transfer device, substrate processing apparatus, and substrate accommodation method'20168,978,670'Substrate processing apparatus'20158,845,262'Substrate processing apparatus, substrate processing method and storage medium storing substrate processing program'20148,662,811'Substrate processing apparatus'20148,408,158'Coating/developing device and method'20138,302,556'Coating and developing apparatus'20128,206,076'Substrate processing system'20127,793,609'Coating and developing apparatus'20107,281,869'Coating and developing system and coating and developing method'20077,267,497'Coating and developing system and coating and developing method'20077,245,348'Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning'20077,241,061'Coating and developing system and coating and developing method'20076,919,913'Processing system'20056,746,197'Substrate processing apparatus and substrate processing method'20046,726,771'Treatment solution supply method and treatment solution supply unit'20046,672,779'Substrate processing apparatus and substrate processing method'20046,656,281'Substrate processing apparatus and substrate processing method'20036,655,891'Substrate treatment system, substrate transfer system, and substrate transfer method'20036,471,422'Substrate processing apparatus and substrate processing method'20026,444,029'Multistage spin type substrate processing system'20026,439,822'Substrate processing apparatus and substrate processing method'20026,432,204'Temperature and humidity controlled processing system'20026,426,303'Processing system'20026,425,722'Substrate treatment system, substrate transfer system, and substrate transfer method'20026,402,400'Substrate processing apparatus'20026,402,401'Substrate processing apparatus and substrate processing method'20026,405,094'Apparatus and method of collecting substrates abnormally processed or processed previous to ordinary processing'20026,402,508'Heat and cooling treatment apparatus and substrate processing system'20026,399,518'Resist coating and developing processing apparatus'20026,379,056'Substrate processing apparatus'20026,341,903'Substrate processing apparatus'20026,340,643'Treatment solution supply method'20026,338,582'Substrate delivery apparatus and coating and developing processing system'20026,332,724'Substrate processing apparatus'20016,318,948'Substrate transfer apparatus and substrate processing apparatus'20016,319,322'Substrate processing apparatus'20016,309,116'Substrate processing system'20016,299,363'Substrate processing apparatus'20016,293,713'Substrate processing apparatus'20016,290,405'Substrate processing apparatus'20016,264,705'Processing system'20016,264,381'Process system'20016,197,372'Coating and developing apparatus, complex apparatus and processing method in coating and developing apparatus'20016,161,969'Apparatus for processing a substrate'20006,126,703'Substrate processing apparatus having an interface section including two stacked substrate waiting table'20006,074,154'Substrate treatment system, substrate transfer system, and substrate transfer method'20005,826,129'Substrate processing system'19985,711,646'Substrate transfer apparatus'19984,338,241'Synthetic resin composition'1982Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1982Based in Onomichi, JP· patent location history
1998–2017Patents assigned to TOKYO ELECTRON LTD (49)· patent assignee history
1998–2015Based in Kumamoto, JP· patent location history
2004–2013Based in Kikuchi-gun, JP· patent location history
2007Based in Suwa, JP· patent location history
2010–2017Based in Koshi, JP· patent location history
2012–2015Patents assigned to UEDA ISSEI (6)· patent assignee history
2012–2013Patents assigned to HAYASHIDA YASUSHI (3)· patent assignee history
2012–2013Patents assigned to AKIMOTO MASAMI (2)· patent assignee history
2012–2013Patents assigned to HAYASHI SHINICHI (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 49 | 1998–2017 |
| UEDA ISSEIself | 6 | 2012–2015 |
| HAYASHIDA YASUSHI | 3 | 2012–2013 |
| AKIMOTO MASAMI | 2 | 2012–2013 |
| HAYASHI SHINICHI | 2 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kumamoto, JP | 38 | 1998–2015 |
| Koshi, JP | 5 | 2010–2017 |
| Suwa, JP | 4 | 2007 |
| Kikuchi-gun, JP | 2 | 2004–2013 |
| Onomichi, JP | 1 | 1982 |