Inventor
James A. Bonham
Inventor
Grant, MN, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%
C07DHeterocyclic compounds23%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests23%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
G03CPhotosensitive materials for photographic purposes5%
B41CProcesses for the manufacture or reproduction of printing surfaces2%
C07CAcyclic or carbocyclic compounds2%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments2%
PatentTitleYear
8,846,981'1,1-di[(alkylphenoxy)ethoxy]cyclohexanes'20148,632,943'Near-infrared sensitive, positive-working, image forming composition and photographic element containing a 1,1-di[(alkylphenoxy)ethoxy]cyclohexane'20146,194,123'Manufacturing method for color proofing elements'20016,010,821'Aqueous developable color proofing elements'20005,847,133'Ionic halomethyl-1,3,5-triazine photoinitiators'19985,723,513'Polymers containing halomethyl-1,3,5-triazine moieties'19985,527,655'Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions'19965,496,504'Halomethyl-1,3,5-triazines containing a monomeric moiety'19965,484,919'Migration-resistant halomethyl-1,3,5-triazine photoinitiator'19965,387,682'Halomethyl-1,3,5-triazines containing a monomeric moiety'19955,298,361'Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator'19945,286,601'Composition containing a halomethyl-1,3,5-triazine containing an amine-containing moiety'19945,187,045'Halomethyl-1,3,5-triazines containing a sensitizer moiety'19935,153,323'Halomethyl-1,3,5-triazines containing a photoinitiator moiety'19925,116,977'Halomethyl-1,3,5-triazines containing an amine-containing moiety'19925,034,526'Halomethyl-1,3,5-triazines containing a sensitizer moiety'19914,985,562'Halomethyl-1,3,5-triazines containing an amine-containing moiety'19913,987,037'Chromophore-substituted vinyl-halomethyl-s-triazines'19763,954,475'Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–2001Patents assigned to MINNESOTA MINING & MFG (17)· patent assignee history
1976Based in Pine Springs, MN, US· patent location history
1991–1998Based in Grant, MN, US· patent location history
1992–1996Based in St. Paul, MN, US· patent location history
1998–2014Based in Lake Elmo, MN, US· patent location history
2014Patents assigned to BONHAM JAMES A (2)· patent assignee history
2014Patents assigned to PLATZER STEPHAN J W (2)· patent assignee history
2014Patents assigned to SOUTHERN LITHOPLATE INC (2)· patent assignee history
2014Patents assigned to BAKER TERESA (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MINNESOTA MINING & MFG | 17 | 1976–2001 |
| BONHAM JAMES Aself | 2 | 2014 |
| PLATZER STEPHAN J W | 2 | 2014 |
| SOUTHERN LITHOPLATE INC | 2 | 2014 |
| BAKER TERESA | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Grant, Minnesota, US | 8 | 1991–1998 |
| Lake Elmo, Minnesota, US | 5 | 1998–2014 |
| St. Paul, Minnesota, US | 4 | 1992–1996 |
| Pine Springs, Minnesota, US | 2 | 1976 |