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Inventor

RYUSEI TERASHIMA

Inventor
JP

Overview

2→
Patents
2024–2025
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
12,372,863Photomask blank, method for producing photomask, and photomask202511,940,391Defect inspection apparatus, method for inspecting defect, and method for manufacturing photomask blank2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history
2024–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO22024–2025
Locations
LocationPatentsSpan
JP22024–2025