Inventor
MITSUHIRO OKADA
Inventor
JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H01LSemiconductor devices12%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
C08LCompositions of macromolecular compounds4%
H01GCapacitors4%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y02PClimate change mitigation technologies in the production or processing of goods4%
PatentTitleYear
12,592,437Square type battery and manufacturing method of square type battery202612,531,304Electricity storage device and insulating holder202612,512,568Terminal structure and power storage device202512,482,663Processing apparatus202512,297,893Speed reducer202512,104,014Polycarbonate resin composition and molded body of same202412,100,616Method of manufacturing semiconductor device202411,764,506Connector and connector pair202311,732,357Substrate processing method and substrate processing apparatus202311,651,671Motion evaluation system, motion evaluation device, and motion evaluation method202311,600,490Silicon film forming method and substrate processing apparatus202311,551,933Substrate processing method and substrate processing apparatus202311,474,505Work support system and work support method202211,424,143Heat insulation structure at lower end of vertical heat treatment apparatus and vertical heat treatment apparatus including heat insulation structure thereof202211,267,970Asphalt modifier, asphalt composition, and asphalt mixture for road pavement202211,251,034Film forming method and substrate processing apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (7)· patent assignee history
2022–2023Patents assigned to HITACHI LTD (2)· patent assignee history
2022–2024Patents assigned to SUMITOMO CHEMICAL CO (2)· patent assignee history
2022–2026Based in JP· patent location history
2025–2026Patents assigned to SANYO ELECTRIC CO (2)· patent assignee history
2025Patents assigned to MINEBEA MITSUMI INC (1)· patent assignee history
2025Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 7 | 2022–2025 |
| HITACHI LTD | 2 | 2022–2023 |
| SANYO ELECTRIC CO | 2 | 2025–2026 |
| SUMITOMO CHEMICAL CO | 2 | 2022–2024 |
| MINEBEA MITSUMI INC | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 15 | 2022–2026 |
| KR | 1 | 2025 |