Inventor
Gouji Wakamatsu
Inventor
Tokyo, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C08LCompositions of macromolecular compounds11%
H01LSemiconductor devices9%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
C07CAcyclic or carbocyclic compounds5%
C07DHeterocyclic compounds3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
C08JWorking-up2%
PatentTitleYear
11,003,079Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound202110,620,534Fluorine-containing polymer, purification method, and radiation-sensitive resin composition202010,146,131Composition, method for producing patterned substrate, film and forming method thereof, and compound201810,082,733Fluorine-containing polymer, purification method, and radiation-sensitive resin composition20189,696,626'Composition for forming a resist underlayer film, and pattern-forming method'20179,500,950'Fluorine-containing polymer, purification method, and radiation-sensitive resin composition'20169,400,429'Composition for forming a resist underlayer film, and pattern-forming method'20169,213,236'Fluorine-containing polymer, purification method, and radiation-sensitive resin composition'20159,029,067'Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same'20158,877,429'Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same'20148,808,974'Method for forming pattern'20148,697,343'Fluorine-containing polymer, purification method, and radiation-sensitive resin composition'20148,697,344'Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern'20148,501,385'Positive-type radiation-sensitive composition, and resist pattern formation method'20138,431,332'Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern'20138,206,894'Resist pattern-forming method and resist pattern miniaturizing resin composition'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2014Patents assigned to WAKAMATSU GOUJI (5)· patent assignee history
2012–2021Based in Tokyo, JP· patent location history
2013–2021Patents assigned to JSR CORP (15)· patent assignee history
2013–2014Patents assigned to SUGIURA MAKOTO (3)· patent assignee history
2013–2014Patents assigned to FUJIWARA KOUICHI (2)· patent assignee history
2013–2014Patents assigned to NISHIMURA YUKIO (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 15 | 2013–2021 |
| WAKAMATSU GOUJIself | 5 | 2012–2014 |
| SUGIURA MAKOTO | 3 | 2013–2014 |
| FUJIWARA KOUICHI | 2 | 2013–2014 |
| NISHIMURA YUKIO | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 16 | 2012–2021 |