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Inventor

Yukio Muroi

Inventor
Tokyo, JP

Overview

2→
Patents
2002–2004
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C30Bprimary
C30BSingle-crystal growth50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
Y10TTechnical subjects covered by former us classification25%
PatentTitleYear
6,682,597'Silicon wafer, and heat treatment method of the same and the heat-treated silicon wafer'20046,428,619'Silicon wafer, and heat treatment method of the same and the heat-treated silicon wafer'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2004Patents assigned to MITSUBISHI MATERIAL SILICON (2)· patent assignee history
2002–2004Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI MATERIAL SILICON22002–2004
Locations
LocationPatentsSpan
Tokyo, JP22002–2004