Inventor

Osamu Hirakawa

Inventor
Koshi, JP

Overview

38→
Patents
1983–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 38 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
Y10TTechnical subjects covered by former us classification12%
H01LSemiconductor devices11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
F16HGearing5%
F01LCyclically operating valves for machines or engines4%
G01SRadio direction-finding4%
B05CApparatus for applying fluent materials to surfaces, in general3%
PatentTitleYear
10,946,419Foreign substance removal apparatus and foreign substance detection apparatus202110,422,875Fastening member, and obstacle detecting device employing fastening member201910,160,015Foreign substance removal apparatus and foreign substance detection apparatus201810,071,544Separation apparatus, separation system, and separation method20189,956,755Separation method, separation apparatus, and separation system20189,919,509'Peeling device, peeling system and peeling method'20189,827,756Separation apparatus, separation system, and separation method20179,823,341'Ultrasonic sensor'20179,679,798'Substrate conveyance apparatus and substrate peeling system'20179,620,099'Ultrasonic transducer device and method of attaching the same'20179,613,797'Cleaning device, peeling system, cleaning method and computer-readable storage medium'20179,343,349'Substrate holding apparatus and substrate holding method'20169,330,898'Separation system, separation method, program and computer storage medium'20169,296,350'Ultrasonic wave device'20168,997,822'Substrate inverting device, substrate inverting method, and peeling system'20158,997,821'Delamination system'20158,490,856'Joint apparatus, joint method, and computer storage medium'20138,330,934'Exposure apparatus and device manufacturing method'20127,924,402'Exposure apparatus and device manufacturing method'20117,838,801'Heating apparatus, heating method, coating apparatus, and storage medium'20107,697,110'Exposure apparatus and device manufacturing method'20107,530,749'Coater/developer and coating/developing method'20095,089,305'Coating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by state'19925,061,144'Resist process apparatus'19915,028,955'Exposure apparatus'19915,002,008'Coating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by state'19914,899,686'Coating device'19904,863,513'Iron-base anti-wear sintered alloy member'19894,790,875'Abrasion resistant sintered alloy'19884,665,766'Shaft member'19874,649,011'Method of making a cam shaft'19874,644,912'Cam shaft and method of manufacture'19874,615,310'Camshaft with lubricating oil supplying function'19864,595,556'Method for manufacturing camshaft'19864,505,485'Rotary seal with linear wear resistant treated layer'19854,468,075'Structure of electrical connecting device'19844,400,795'Magnetic bubble memory device'19834,368,465'Method of actuating a plasma display panel'1983

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–1988Patents assigned to NIPPON PISTON RING CO LTD (7)· patent assignee history
1985–1987Based in Saitama, JP· patent location history
1986–1988Based in Yono, JP· patent location history
1989–2018Patents assigned to HIRAKAWA OSAMU (8)· patent assignee history
1990–2021Patents assigned to TOKYO ELECTRON LTD (23)· patent assignee history
1990–1992Patents assigned to TEL KYUSHU KK (5)· patent assignee history
1990–2017Based in Kumamoto, JP· patent location history
2010–2021Based in Koshi, JP· patent location history
2016–2019Based in Mie, JP· patent location history
2017–2018Patents assigned to INTEL CORP (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD231990–2021
HIRAKAWA OSAMUself81989–2018
NIPPON PISTON RING CO LTD71985–1988
INTEL CORP52017–2018
TEL KYUSHU KK51990–1992
Locations
LocationPatentsSpan
Koshi, JP152010–2021
Kumamoto, JP71990–2017
Mie, JP42016–2019
Saitama, JP41985–1987
Yono, JP31986–1988