Inventor
Tohru Kubota
Inventor
Joetsu-shi, JP
Overview
Patents· 73 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Fprimary
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium44%
B82YSpecific uses or applications of nanostructures6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
B05DProcesses for applying fluent materials to surfaces, in general3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
Y10TTechnical subjects covered by former us classification2%
PatentTitleYear
10,501,585Stretchable film and method for forming the stretchable film201910,266,555Polycyclic aminosilane compounds and making method201910,065,975Amino-containing organosilicon compound and making method20189,862,735'Organosilicon compound having diphenylethyl and methoxysilyl and making method'20189,862,812'Composition containing nitrogen-containing organoxysilane compound and method for making the same'20189,567,354'Amino acid-modified silane compounds and making method'20179,416,147'Preparation of silazane compound'20169,371,341'Cyclic aminoorganoxysilane compound and its production method'20169,233,988'Silyl-protected nitrogen-containing cyclic compounds and making method'20169,193,597'Method for purifying chlorosilanes'20159,139,603'[3-(2-norbornyl)-2-norbornyl]silane compound and making method'20159,126,838'Method for purifying chlorosilanes'20159,090,502'Nanoimprint-mold release agent, surface treatment method, and nanoimprint mold'20159,024,051'Organoxysilane compounds having silyl-protected secondary amino group and making method'20158,927,754'Silazane compounds having fluoroalkyl group and method of preparing the same'20158,541,631'Surface treatment method for solid material'20138,536,359'Alkoxysilane compounds having fluoroalkyl group and method of preparing the same'20138,436,166'Amino-containing vinylsilane compounds and making method'20138,178,710'Silyl (meth)acrylate compound containing a siloxy group having a bulky substituent and its production method'20128,049,027'Organosilicon compound having amino group and its production method'20117,918,982'Production device and production method for conductive nano-wire'20117,834,120'Monofunctional monomer having cage oligosiloxane structure and method of making'20107,576,231'Method for producing isocyanate group-containing siloxane compound'20097,569,691'Protected piperazino group-bearing organoxysilane compound and making method'20097,351,313'Production device and production method for conductive nano-wire'20087,307,178'Processes of making γ,δ-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making'20077,279,589'Preparation of 1-(alkoxysilyl)ethyl-1,1,3,3-tetramethyldisiloxane'20077,202,375'Bissilylamino group-bearing chlorosilane compound and preparation method, and method of preparing bissilylamino group-bearing organooxysilane compound'20077,189,868'Cyclic siloxane compounds and making method'20077,112,710'Preparation of silyl ketene acetal and disilyl ketene acetal'20067,056,446'Method of manufacturing nano-gap electrode'20067,053,233'Silane compound having at least two protected functional groups and method for preparing the same'20066,994,945'Silicon-containing polymer, resist composition and patterning process'20066,960,679'Preparation of silyl ketene acetal and disilyl ketene acetal'20056,943,264'Preparation of branched siloxane'20056,875,881'Preparation of branched tetrasiloxane'20056,875,880'Silylation of hydroxyl groups'20056,623,909'Polymers, resist compositions and patterning process'20036,518,447'Thexylchlorosilanes and making process'20036,498,264'Silyl (meth)acrylates having bulky substituent group and preparation thereof'20026,426,427'Preparation of bissilylnorbornane compounds'20026,359,161'Preparation of halopropyldimethylchlorosilanes'20026,337,415'Process for preparing tetrakis (trimethylsily) silane and tris (trimethysilyl) silane'20026,334,935'Distillation of (meth) acryloxy-bearing alkoxysilane'20026,291,696'Preparation of tris (trimethylsilyl) silylethyl esters'20016,274,754'Preparation of bis(3-aminopropyldimethylsilyl)benzene compounds'20016,245,925'Hydrosilylation of 4-vinyl-1-cyclohexene'20016,239,303'Silylation of hydroxyl group-containing compound'20016,087,520'Preparation of 1,3-bis(3-aminopropyl)tetramethyldisiloxane'20005,583,244'Siloxane-containing pullulan and method for the preparation thereof'19965,461,166'Chemically adsorbed ultrathin film and its material, and method of manufacturing the same'19955,455,360'1-pyrrolyl silicon compounds, chemically adsorbed ultrathin film formed therefrom and method of manufacturing the same'19955,451,693'Tert-butyl cycloalkyl dialkoxysilane compounds and method for preparing same'19955,440,063'Concurrent preparation of dimethylchlorosilane and triorganochlorosilane'19955,425,988'Recording and reproducing device which includes a protective film and a monomolecular fluoro organo silicon film'19955,342,984'Triorganomonohalogenosilane'19945,342,983'Organic silicon compounds'19945,326,895'3-(vinylbenzyloxy)propylsilane compounds'19945,294,727'Method for preparing tertiary hydrocarbon-silyl compounds'19945,258,537'Method for preparing organomonochlorosilane'19935,254,439'Light-sensitive polymer, method for preparing the same and method for forming patterns'19935,223,170'Fiber treating compositions'19935,210,252'3-(vinylphenyloxy)propylsilane compound'19935,202,452'Terminal perfluoroalkylsilane compound and a process for preparing the same'19935,126,419'Light-sensitive polymer, method for preparing the same andmethod for forming patterns'19925,116,973'Caprolactam silane compound and a method of manufacturing the same'19925,081,260'3-(2-oxo-1-pyrrolidinyl)-propylsilanes and method for preparing the silane compounds'19925,017,715'Iodotrimethylsilane compositions'19915,000,881'Polymerizable organosilane compound'19914,957,607'Method for the preparation of a cycloalkyl silane compound'19904,921,989'.OMEGA.silylalkynyl silane compound and method for preparation thereof'19904,895,966'Polymerizable organosilane compound'19904,883,569'Method for the preparation of a cycloalkyl silane compound'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2019Patents assigned to SHINETSU CHEMICAL CO (68)· patent assignee history
1989–2015Based in Niigata, JP· patent location history
1991–2019Based in Joetsu-shi, JP· patent location history
1992–1995Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (6)· patent assignee history
1992–2006Based in Tokyo, JP· patent location history
2000–2006Based in Nishikamo-gun, JP· patent location history
2008–2011Based in Koganei, JP· patent location history
2012–2017Patents assigned to KUBOTA TOHRU (9)· patent assignee history
2013–2017Patents assigned to HONMA TAKAYUKI (4)· patent assignee history
2013–2015Patents assigned to KIYOMORI AYUMU (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 68 | 1989–2019 |
| KUBOTA TOHRUself | 9 | 2012–2017 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 6 | 1992–1995 |
| HONMA TAKAYUKI | 4 | 2013–2017 |
| KIYOMORI AYUMU | 4 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 33 | 1991–2019 |
| Niigata, JP | 22 | 1989–2015 |
| Nishikamo-gun, JP | 10 | 2000–2006 |
| Tokyo, JP | 3 | 1992–2006 |
| Koganei, JP | 2 | 2008–2011 |