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Inventor

Slumin Wang

Inventor
Naperville, IL, US

Overview

1→
Patents
2003
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions33%
C09KMaterials for miscellaneous applications, not provided for elsewhere33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,620,037'Chemical mechanical polishing slurry useful for copper substrates'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003Patents assigned to CABOT MICROELECTRONICS CORP (1)· patent assignee history
2003Based in Naperville, IL, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CABOT MICROELECTRONICS CORP12003
Locations
LocationPatentsSpan
Naperville, Illinois, US12003