Inventor
Rene Theodorus Petrus Compen
Inventor
Valkenswaard, NL
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01LSemiconductor devices9%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%
B24BMachines, devices, or processes for grinding or polishing3%
C23CCoating metallic material3%
C23FNon-mechanical removal of metallic material from surface3%
PatentTitleYear
9,329,497'Substrate table, lithographic apparatus and device manufacturing method'20169,019,476'Lithographic apparatus and device manufacturing method'20159,013,682'Clamping device and object loading method'20158,902,399'Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus'20148,810,777'Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system'20148,792,085'Lithographic apparatus, substrate table, and method for enhancing substrate release properties'20148,384,882'Calibration method and lithographic apparatus for calibrating an optimum take over height of a substrate'20138,269,949'Lithographic apparatus and device manufacturing method'20128,154,709'Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus'20128,149,387'Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus'20128,086,348'Method of transferring a substrate, transfer system and lithographic projection apparatus'20118,064,045'Method of transferring a substrate, transfer system and lithographic projection apparatus'20117,978,308'Lithographic apparatus and device manufacturing method'20117,791,708'Lithographic apparatus, substrate table, and method for enhancing substrate release properties'20107,639,345'Lithographic apparatus'20097,385,670'Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus'20087,050,147'Method of adjusting a height of protrusions on a support surface of a support table, a lithographic projection apparatus, and a support table for supporting an article in a lithographic apparatus'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2016Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2006–2016Based in Valkenswaard, NL· patent location history
2011–2016Patents assigned to COMPEN RENE THEODORUS PETRUS (12)· patent assignee history
2011–2013Patents assigned to VAN NUNEN GERARDUS PETRUS MATTHIJS (5)· patent assignee history
2011–2012Patents assigned to ALBERTI JOZEF AUGUSTINUS MARIA (4)· patent assignee history
2011–2012Patents assigned to GROENSMIT FRANS ERIK (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2006–2016 |
| COMPEN RENE THEODORUS PETRUSself | 12 | 2011–2016 |
| VAN NUNEN GERARDUS PETRUS MATTHIJS | 5 | 2011–2013 |
| ALBERTI JOZEF AUGUSTINUS MARIA | 4 | 2011–2012 |
| GROENSMIT FRANS ERIK | 4 | 2011–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Valkenswaard, NL | 17 | 2006–2016 |