Inventor

Thomas Scheiter

Inventor

Munich, DE

Overview

23→

Patents

1994–2006

Patent span

Physics

Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Lprimary

G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure20%

G01PMeasuring linear or angular speed, acceleration, deceleration, or shock14%

G06VImage or video recognition or understanding12%

B81BMicrostructural devices or systems, e.g. micromechanical devices6%

B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems6%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

G01DMeasuring not specially adapted for a specific variable4%

H10DInorganic electric semiconductor devices4%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

PatentTitleYear

7,054,469'Passivation layer structure'2006 6,714,392'Electronic component and utilization of a guard structure contained therein'2004 6,668,072'Method for producing a reference image for pattern recognition tasks'2003 6,664,612'Semiconductor component having double passivating layers formed of two passivating layers of different dielectric materials'2003 6,401,544'Micromechanical component protected from environmental influences'2002 6,365,888'Method for capacitive image acquisition'2002 6,320,239'Surface micromachined ultrasonic transducer'2001 6,159,762'Process for producing micromechanical sensors'2000 6,140,689'Micromechanical sensor'2000 6,094,985'Rotation rate sensor'2000 6,020,050'Semiconductor chip'2000 5,974,895'Capacitively measuring sensor and readout circuit'1999 5,918,110'Method for manufacturing a combination of a pressure sensor and an electrochemical sensor'1999 5,883,779'Pressure sensor'1999 5,834,332'Micromechanical semiconductor components and manufacturing method therefor'1998 5,760,455'Micromechanical semiconductor component and manufacturing method therefor'1998 5,700,702'Method for manufacturing an acceleration sensor'1997 5,662,772'Method for the selective removal of silicon dioxide'1997 5,631,428'Capacitive semiconductor pressure sensor'1997 5,450,754'Pressure sensor'1995 5,447,067'Acceleration sensor and method for manufacturing same'1995 5,431,051'Tunnel effect acceleration sensor'1995 5,373,181'Sensor for sensing fingerpaints and method for producing the sensor'1994

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2003Patents assigned to SIEMENS AG (17)· patent assignee history

1994–2000Based in Munich, DE· patent location history

2000–2006Based in Oberhaching, DE· patent location history

2002–2006Patents assigned to INFINEON TECHNOLOGIES AG (5)· patent assignee history

2002Based in Strasslach, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SIEMENS AG	17	1994–2003
INFINEON TECHNOLOGIES AG	5	2002–2006

Locations

Location	Patents	Span
Munich, DE	13	1994–2000
Oberhaching, DE	9	2000–2006
Strasslach, DE	1	2002