Inventor
Jun Hatakeyama
Inventor
Joetsu-shi, JP
Overview
Patents· 453 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
C07CAcyclic or carbocyclic compounds6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
C08LCompositions of macromolecular compounds4%
C07DHeterocyclic compounds3%
H01LSemiconductor devices3%
PatentTitleYear
11,078,317Stretchable film and method for forming the same202111,071,485Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode202111,048,165Resist composition and patterning process202111,022,883Resist composition and patterning process202110,996,378Antireflective film, method of producing antireflective film, and eyeglass type display202110,968,175Resist composition and patterning process202110,950,364Bio-electrode and method for manufacturing the same202110,948,822Resist composition and patterning process202110,934,463Adhesive film, method for forming an adhesive film, and urethane polymer202110,915,021Monomer, polymer, resist composition, and patterning process202110,901,120Transparent antireflective lamination film, method of forming antireflective lamination film, and eyeglass type display202110,871,711Resist composition and patterning process202010,864,366Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode202010,851,188Polymer compound for conductive polymer and method for producing same202010,844,257Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode202010,816,899Resist composition and patterning process202010,809,617Resist composition and patterning process202010,808,148Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt202010,802,400Resist composition and patterning process202010,800,916Stretchable film composition, stretchable film, and method for forming the same202010,792,489Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode202010,759,938Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode202010,743,788Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode202010,734,132Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer compound202010,726,967Polymerizable monomer, polymer compound, biological electrode composition, biological electrode, and method for producing biological electrode202010,725,378Resist composition and patterning process202010,717,804Silicon-containing compound, urethane resin, stretchable film, and method for forming the same202010,695,554Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer202010,696,779Silicon-containing compound, urethane resin, stretchable film, and method for forming the same202010,698,314Chemically amplified resist composition and patterning process202010,649,332Resist composition and patterning process202010,620,533Resist composition and patterning process202010,613,437Resist composition and patterning process202010,613,436Resist composition and patterning process202010,610,116Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode202010,606,172Resist composition and patterning process202010,591,819Monomer, polymer, resist composition, and patterning process202010,584,221Stretchable film, method for forming the same, stretchable wiring film, and method for manufacturing the same202010,559,397Conductive polymer composite and substrate202010,544,272Stretchable film and method for forming the same, method for manufacturing coated wiring substrate, and stretchable wiring film and method for manufacturing the same202010,527,939Monomer, polymer, resist composition, and patterning process202010,520,809Resist composition and patterning process201910,520,811Resist composition and patterning process201910,515,735Conductive polymer composite and substrate201910,508,162Polymer compound for conductive polymer and method for producing same201910,509,314Resist composition and patterning process201910,501,585Stretchable film and method for forming the stretchable film201910,474,030Resist composition and patterning process201910,457,761Polymer, resist composition, and pattern forming process201910,377,207Vehicle air-conditioning device201910,377,842Polymer, negative resist composition, and pattern forming process201910,372,038Chemically amplified resist composition and patterning process201910,363,555Polymer compound for conductive polymer and method for producing the same201910,323,113Resist composition and patterning process201910,303,056Resist composition and patterning process201910,303,052Resist composition and patterning process201910,295,906Conductive polymer composition, coated article, and patterning process201910,295,904Resist composition and patterning process201910,281,818Resist composition and patterning process201910,240,061Conductive polymer composite and substrate201910,228,621Underlayer film-forming composition and pattern forming process201910,222,696Resist composition and patterning process201910,191,372Polymer, positive resist composition, and pattern forming process201910,191,373Method for producing polymer201910,162,262Resist composition and patterning process201810,156,788Resist underlayer film composition, patterning process, and compound201810,126,649Resist composition and patterning process using the same201810,125,202Polymer compound for a conductive polymer and method for producing same201810,126,647Resist composition and patterning process201810,101,653Resist composition and patterning process201810,101,654Resist composition and patterning process201810,078,264Resist composition, patterning process, and barium, cesium and cerium salts201810,053,588Conductive material and substrate201810,047,237Conductive material and substrate201810,023,674Monomer, polymer, resist composition, and patterning process201810,023,752Conductive material and substrate201810,020,089Conductive polymer composite and substrate201810,012,903Resist composition and pattern forming process201810,012,902Positive resist composition and pattern forming process201810,005,868Resist composition and patterning process using the same201810,007,178Positive resist composition and patterning process20189,991,019Conductive polymer composite and substrate20189,989,847Onium salt compound, resist composition, and pattern forming process20189,984,878Resist under layer film composition and patterning process20189,958,776Resist composition and patterning process20189,958,777Resist composition and patterning process20189,927,708'Pattern forming process and shrink agent'20189,922,747'Conductive material and substrate'20189,916,916'Conductive material and substrate'20189,910,358'Patterning process and chemically amplified negative resist composition'20189,897,914'Resist composition and patterning process'20189,897,917'Conductive polymer composition, coated article, and patterning process'20189,899,218'Resist under layer film composition and patterning process'20189,897,916'Compound, polymer compound, resist composition, and patterning process'20189,869,931'Resist composition and patterning process'20189,857,686'Composition for forming resist underlayer film and patterning process'20189,846,360Resist composition and patterning process20179,829,792Monomer, polymer, positive resist composition, and patterning process20179,817,314'Conductive polymer composition, coated article, patterning process, and substrate'20179,810,983'Polymer, chemically amplified positive resist composition and patterning process'20179,804,492'Method for forming multi-layer film and patterning process'20179,798,242'Rinse solution for pattern formation and pattern forming process'20179,790,166'Polymer, monomer, resist composition, and patterning process'20179,788,422'Conductive material and substrate'20179,785,049'Method for forming multi-layer film and patterning process'20179,778,570'Conductive polymer composition, coated article, patterning process and substrate'20179,777,093'Polymer compound for a conductive polymer and method for producing same'20179,758,609'Monomer, polymer, resist composition, and patterning process'20179,760,010'Patterning process'20179,752,045'Conductive polymer composite and substrate'20179,720,324'Resist composition and pattern forming process'20179,709,890'Resist composition and patterning process'20179,666,327'Conductive polymer material and substrate'20179,665,002'Onium salt compound, resist composition, and pattern forming process'20179,663,593'Polymer compound for a conductive polymer and method for producing same'20179,663,656'Conductive polymer material and substrate'20179,658,530'Process for forming multi-layer film and patterning process'20179,657,115'Polymer compound for a conductive polymer and method for manufacturing same'20179,658,532'Pattern forming process'20179,645,498'Developer and patterning process using the same'20179,632,417'Shrink material and pattern forming process'20179,632,416'Rinse solution for pattern formation and pattern forming process'20179,632,415'Pattern forming process and shrink agent'20179,623,719'Thermal management system for electric vehicle and its control method'20179,618,850'Pattern forming process and shrink agent'20179,620,363'Underlayer film-forming composition and pattern forming process'20179,601,229'Conductive polymer composite comprising a sulfo group-containing dopant polymer'20179,595,362'Conductive polymer composition comprising a sulfo group-containing dopant polymer'20179,587,137'Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrate'20179,568,821'Patterning process'20179,551,929'Positive resist composition and patterning process'20179,527,937'Polymer compound for a conductive polymer and method for producing same'20169,524,863'Method for cleaning and drying semiconductor substrate'20169,523,914'Chemically amplified resist composition and patterning process'20169,507,262'Resist top-coat composition and patterning process'20169,493,597'Polymer compound having a specific super strongly acidic sulfo group'20169,482,949'Positive resist composition and patterning process'20169,442,376'Positive resist composition and patterning process'20169,436,093'Pattern forming process and shrink agent'20169,429,846'Pattern forming process and shrink agent'20169,429,843'Positive resist composition and patterning process'20169,411,226'Chemically amplified resist composition and patterning process'20169,366,963'Resist composition and pattern forming process'20169,360,753'Resist composition and patterning process'20169,360,760'Pattern forming process and shrink agent'20169,335,633'Positive resist composition and patterning process'20169,335,632'Positive resist composition and patterning process'20169,316,915'Negative resist composition and pattern forming process'20169,316,909'Patterning process'20169,315,670'Composition for forming resist underlayer film and patterning process'20169,310,683'Monomer, polymer, positive resist composition and patterning process'20169,310,681'Negative resist composition and patterning process using same'20169,274,428'Resist top coat composition and patterning process'20169,274,425'Resist composition and patterning process'20169,250,522'Positive resist composition and patterning process'20169,250,517'Polymer, positive resist composition and patterning process'20169,250,518'Resist composition and patterning process'20169,250,523'Resist composition and patterning process'20169,244,350'Positive resist composition and patterning process'20169,233,919'Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method'20169,207,534'Nitrogen-containing monomer, polymer, resist composition, and patterning process'20159,201,300'Resist composition and patterning process'20159,201,304'Pattern forming process'20159,164,383'Resist composition and patterning process'20159,162,967'Sulfonium salt, polymer, resist composition, and patterning process'20159,164,392'Developer and patterning process'20159,152,050'Resist composition and patterning process'20159,146,464'Sulfonium salt, polymer, polymer making method, resist composition, and patterning process'20159,146,468'Resist underlayer film composition and patterning process using the same'20159,140,988'Positive resist composition, monomer, polymer, and patterning process'20159,136,121'Underlayer film-forming composition and pattern forming process'20159,136,122'Underlayer film-forming composition and pattern forming process'20159,122,152'Patterning process and resist composition'20159,122,147'Pattern forming process'20159,104,105'Patterning process and resist composition'20159,104,110'Polymer, resist composition and patterning process'20159,091,933'Negative pattern forming process'20159,091,914'Resist composition and patterning process'20159,091,918'Sulfonium salt, polymer, resist composition, and patterning process'20159,086,625'Resist composition and patterning process'20159,086,624'Monomer, polymer, resist composition, and patterning process'20159,081,290'Patterning process and resist composition'20159,075,308'Positive resist composition and patterning process'20159,063,413'Resist composition, patterning process, monomer, and copolymer'20159,057,959'Developer for photosensitive resist material and patterning process'20159,057,949'Patterning process, resist composition, polymer, and polymerizable ester compound'20159,052,603'Pattern forming process'20159,052,602'Developer for photosensitive resist material and patterning process'20159,052,593'Resist composition and patterning process'20159,040,222'Polymerizable tertiary ester compound, polymer, resist composition, and patterning process'20159,040,223'Resist composition, patterning process and polymer'20159,029,075'Resist-protective film-forming composition and patterning process'20159,029,064'Patterning process and resist composition'20159,023,586'Positive resist composition and patterning process using same'20159,023,587'Negative resist composition and patterning process'20159,017,923'Negative resist composition and patterning process using the same'20159,017,918'Monomer, polymer, chemically amplified positive resist composition, and patterning process'20159,017,922'Chemically amplified resist composition and patterning process'20159,017,931'Patterning process and resist composition'20158,999,630'Patterning process and resist composition'20158,992,790'Patterning process'20158,993,222'Pattern forming process'20158,980,527'Pattern forming process and resist compostion'20158,951,712'Resist protective film-forming composition and patterning process'20158,932,803'Pattern forming process'20158,933,251'Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process'20158,921,026'Basic compound, chemically amplified resist composition, and patterning process'20148,911,929'Developer and patterning process'20148,895,231'Patterning process and resist composition'20148,883,379'Resist-protective film-forming composition and patterning process'20148,877,424'Monomer, polymer, resist composition, and patterning process'20148,865,390'Patterning process and resist composition'20148,859,181'Chemically amplified negative resist composition and patterning process'20148,846,303'Resist top coat composition and patterning process'20148,841,061'Positive resist composition and patterning process'20148,828,641'Chemically amplified resist composition and patterning process'20148,828,647'Patterning process and resist composition'20148,822,136'Patterning process and resist composition'20148,815,492'Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process'20148,808,966'Positive resist composition and patterning process'20148,790,866'Patterning process and resist composition'20148,791,290'Acetal compound, polymer, resist composition, and patterning process'20148,785,105'Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method'20148,778,592'Positive resist composition and patterning process'20148,753,805'Patterning process and resist composition'20148,741,548'Patterning process'20148,741,554'Patterning process and resist composition'20148,741,546'Patterning process and resist composition'20148,735,046'Positive resist composition and patterning process'20148,703,404'Patterning process'20148,703,408'Patterning process'20148,691,494'Patterning process'20148,652,756'Positive resist composition and patterning process'20148,652,757'Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film'20148,632,939'Polymer, chemically amplified positive resist composition and pattern forming process'20148,623,590'Pattern forming process'20148,617,800'Patterning process'20138,574,816'Positive resist composition and patterning process'20138,574,817'Positive resist composition and patterning process'20138,507,173'Patterning process'20138,507,175'Patterning process and resist composition'20138,501,384'Positive resist composition and patterning process'20138,492,078'Patterning process'20138,450,048'Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film'20138,450,042'Positive resist composition and patterning process'20138,440,386'Patterning process, resist composition, and acetal compound'20138,431,323'Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process'20138,426,105'Resist-modifying composition and pattern forming process'20138,426,110'Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound'20138,426,115'Patterning process and resist composition'20138,367,310'Pattern forming process and resist-modifying composition'20138,361,703'Resist protective coating composition and patterning process'20138,349,533'Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process'20138,338,078'Photoresist undercoat-forming material and patterning process'20128,329,384'Resist-modifying composition and pattern forming process'20128,323,872'Resist protective coating material and patterning process'20128,313,890'Antireflective coating composition, antireflective coating, and patterning process'20128,313,886'Resist composition and patterning process'20128,288,072'Resist lower layer film-formed substrate'20128,268,528'Resist composition and patterning process'20128,252,504'Polymer, resist composition, and patterning process'20128,247,166'Double patterning process'20128,216,774'Patterning process'20128,211,618'Positive resist composition and patterning process'20128,198,016'Patterning process'20128,192,921'Patterning process'20128,158,330'Resist protective coating composition and patterning process'20128,129,099'Double patterning process'20128,129,100'Double patterning process'20128,129,086'Polymerizable compound, polymer, positive resist composition, and patterning process using the same'20128,105,764'Patterning process'20128,105,760'Patterning process and pattern surface coating composition'20128,105,748'Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process'20128,101,341'Patterning process'20128,101,335'Resist composition and patterning process'20128,088,554'Bottom resist layer composition and patterning process using the same'20128,088,537'Resist top coat composition and patterning process'20128,062,828'Positive resist composition and patterning process'20118,057,982'Monomer, resist composition, and patterning process'20118,057,985'Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process'20118,057,981'Resist composition, resist protective coating composition, and patterning process'20118,048,610'Sulfonium salt-containing polymer, resist composition, and patterning process'20118,043,788'Resist composition and patterning process'20118,039,198'Sulfonium salt-containing polymer, resist composition, and patterning process'20118,003,295'Patterning process and resist composition used therein'20117,923,195'Positive resist composition and patterning process using the same'20117,887,991'Positive resist composition and patterning process using the same'20117,879,530'Antireflective coating composition, antireflective coating, and patterning process'20117,871,761'Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern'2011RE041580'Lactone-containing compounds, polymers, resist compositions, and patterning method'20107,771,914'Resist composition and patterning process'20107,771,913'Resist composition and patterning process using the same'20107,759,047'Resist protective film composition and patterning process'20107,745,104'Bottom resist layer composition and patterning process using the same'20107,741,015'Patterning process and resist composition'20107,687,228'Antireflection film composition and patterning process using the same'20107,678,530'Lactone-containing compound, polymer, resist composition, and patterning process'20107,670,750'Polymer, resist protective coating material, and patterning process'20107,666,572'Resist top coat composition and patterning process'20107,666,967'Ester compound, polymer, resist composition, and patterning process'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2021Patents assigned to SHINETSU CHEMICAL CO (430)· patent assignee history
1991–1998Based in Annaka, JP· patent location history
1998–2006Based in Nishikamo-gun, JP· patent location history
2000–2016Based in Niigata, JP· patent location history
2003–2010Patents assigned to CENTRAL GLASS CO LTD (29)· patent assignee history
2007–2021Based in Joetsu-shi, JP· patent location history
2011–2016Patents assigned to HATAKEYAMA JUN (76)· patent assignee history
2011–2015Patents assigned to KATAYAMA KAZUHIRO (19)· patent assignee history
2012–2015Patents assigned to HASEGAWA KOJI (20)· patent assignee history
2012–2021Based in Jyoetsu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 430 | 1991–2021 |
| HATAKEYAMA JUNself | 76 | 2011–2016 |
| CENTRAL GLASS CO LTD | 29 | 2003–2010 |
| HASEGAWA KOJI | 20 | 2012–2015 |
| KATAYAMA KAZUHIRO | 19 | 2011–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 248 | 2007–2021 |
| Niigata, JP | 65 | 2000–2016 |
| Jyoetsu, JP | 63 | 2012–2021 |
| Nishikamo-gun, JP | 55 | 1998–2006 |
| Annaka, JP | 6 | 1991–1998 |