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Inventor

Mitsuo Akutsu

Inventor
Tokyo, JP

Overview

25→
Patents
1976–2010
Patent span
Chemistry
Primary field (CPC C)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients16%
B41MPrinting, duplicating, marking, or copying processes15%
C07CAcyclic or carbocyclic compounds5%
C07DHeterocyclic compounds5%
Y10TTechnical subjects covered by former us classification5%
B29CShaping or joining of plastics4%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts4%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering4%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C08LCompositions of macromolecular compounds4%
PatentTitleYear
7,696,257'Oxime ester compound and photopolymerization initiator containing such compound'20107,648,651'Solvent composition'20107,507,355'Solvent composition'20096,432,875'Thermal recording material'20026,319,652'Energy beam curable epoxy resin composition'20016,117,487'Process for forming metal oxide film by means of CVD system'20005,985,510'Energy beam curable epoxy resin composition, stereolithographic resin composition and stereolithographic method'19995,607,894'Heat-sensitive recording material'19975,181,988'Method for preventing the discoloration of paper and paper treated to prevent discoloring'19935,175,138'Heat-sensitive recording material'19925,081,099'Heat-sensitive recording material'19924,980,336'Heat-sensitive recording material'19904,944,980'Optical recording material'19904,918,046'Heat-sensitive recording material'19904,889,672'Process for producing ceramic molding'19894,774,367'Phenol compound and heat-sensitive recording material'19884,707,507'2,2,6,6-tetramethyl quaternary ammonium halides and synthetic resin and stabilizer compositions'19874,463,113'Bis-phenol phosphates as clarifiers for polyolefin resins'19844,362,831'Synergistic light and heat stabilizer compositions for synthetic resins and resin compositions containing the same'19824,309,335'Polyphenylene oxide resin composition stabilizer'19824,258,142'Clarified olefin polymer composition'19814,243,581'Stabilized polypropylene composition'19814,239,803'Ethylene polymer composition'19804,221,700'Stabilized polymer composition'19803,997,551'3-Salicylamido-s-triazoles'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1981Patents assigned to ARGUS CHEM (3)· patent assignee history
1976–2010Based in Tokyo, JP· patent location history
1980–2002Based in Urawa, JP· patent location history
1981–1984Based in Katsushika-ku, JP· patent location history
1982–1992Patents assigned to ADEKA ARGUS CHEMICAL CO LTD (8)· patent assignee history
1982–1984Patents assigned to AKUTSU MITSUO (2)· patent assignee history
1992–2002Patents assigned to ASAHI DENKA KOGYO KK (6)· patent assignee history
1997–2010Based in Saitama, JP· patent location history
2009–2010Patents assigned to ADEKA CORP (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADEKA ARGUS CHEMICAL CO LTD81982–1992
ASAHI DENKA KOGYO KK61992–2002
ADEKA CORP32009–2010
ARGUS CHEM31976–1981
AKUTSU MITSUOself21982–1984
Locations
LocationPatentsSpan
Tokyo, JP141976–2010
Urawa, JP61980–2002
Saitama, JP31997–2010
Katsushika-ku, JP21981–1984