Inventor
RYU NAKANO
Inventor
JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material29%
H01LSemiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01JElectric discharge tubes or discharge lamps11%
H10DInorganic electric semiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
PatentTitleYear
12,590,364Cyclical deposition methods202612,442,082Reactor system comprising a tuning circuit202512,394,626Method of forming a structure and system for same202512,074,022Method and system for forming patterned structures using multiple patterning process202412,033,849Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane202411,970,769Cyclical deposition methods202411,830,738Method for forming barrier layer and method for manufacturing semiconductor device202311,527,400Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane202211,482,418Substrate processing method and apparatus202211,302,527Methods for forming doped silicon oxide thin films2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to ASM IP HOLDING BV (9)· patent assignee history
2022Patents assigned to ASM INT NV (1)· patent assignee history
2022–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM IP HOLDING BV | 9 | 2022–2026 |
| ASM INT NV | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 10 | 2022–2026 |