LexDanaLexDanabeta
Inventor

Yasuyuki Hotta

Inventor
Tokyo, JP

Overview

49→
Patents
1998–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 49 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Tprimary
Y10TTechnical subjects covered by former us classification8%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution8%
B82YSpecific uses or applications of nanostructures7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
Y02PClimate change mitigation technologies in the production or processing of goods5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
H05KPrinted circuits4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
C03CChemical composition of glasses, glazes or vitreous enamels3%
PatentTitleYear
10,873,080Secondary battery, battery pack, vehicle, and stationary power supply202010,868,331Secondary battery, battery pack, vehicle, and stationary power supply202010,790,543Secondary battery, battery pack, vehicle, and stationary power supply202010,756,349Secondary battery, battery pack, vehicle, and stationary power supply202010,461,370Secondary battery, battery pack, and vehicle201910,319,992Electrode for nonaqueous electrolyte secondary battery, nonaqueous electrolyte secondary battery, and battery pack201910,211,459Electrode material, electrode, nonaqueous electrolyte battery including the same, and battery pack201910,044,034Negative electrode material for nonaqueous electrolyte secondary battery, negative electrode for nonaqueous electrolyte secondary battery, nonaqueous electrolyte secondary battery and battery pack20189,876,220Electrode for non-aqueous electrolytic battery, non-aqueous electrolytic secondary battery, and battery pack20189,859,553'Negative electrode active material for nonaqueous electrolyte secondary battery, nonaqueous electrolyte secondary battery, and battery pack'20189,859,536'Nonaqueous electrolyte battery including a sealed case, battery pack and storage battery apparatus'20189,786,902'Electrode for non-aqueous electrolytic battery, non-aqueous electrolytic secondary battery, and battery pack'20179,550,322'Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method'20179,362,033'Magnetic material, method for producing magnetic material, and inductor element'20169,318,737'Negative electrode material for non-aqueous electrolyte secondary battery, negative electrode active material for non-aqueous electrolyte secondary battery, and non-aqueous electrolyte secondary battery'20169,029,047'Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method'20158,986,839'Metal-containing particle aggregate, metal-containing particle composite member, and method of manufacturing the aggregate and the composite member'20158,988,301'Core-shell magnetic material, method for producing core-shell magnetic material, device, and antenna device'20158,883,310'Metal-containing particle aggregate, metal-containing particle composite member, and method of manufacturing the aggregate and the composite member'20148,840,800'Magnetic material, method for producing magnetic material, and inductor element'20148,828,276'Metal nanoparticle dispersion'20148,778,201'Method for manufacturing porous structure and method for forming pattern'20148,475,922'Nanoparticle composite material and antenna device and electromagnetic wave absorber using the same'20138,435,416'Method for manufacturing porous structure and method for forming pattern'20138,394,877'Method for manufacturing porous structure and method for forming pattern'20138,303,853'Method of producing a metallic nanoparticle inorganic composite, metallic nanoparticle inorganic composite, and plasmon waveguide'20128,043,520'Method for manufacturing porous structure and method for forming pattern'20117,972,539'Process for producing metallic-nanoparticle inorganic composite and metallic-nanoparticle inorganic composite'20117,738,752'Optical waveguide system'20107,517,466'Method for manufacturing porous structure and method for forming pattern'20097,414,417'Contact sheet for testing electronic parts, apparatus for testing electronic parts, method for testing electronic parts, method for manufacturing electronic parts and electronic parts'20087,370,412'Method for connecting electronic device'20087,329,458'Wiring member and method of manufacturing the same'20087,312,621'Semiconductor test unit having low contact resistance with examined electronic products, semiconductor contact board, method for testing semiconductor device, semiconductor device, and method for manufacturing thereof'20077,097,781'Method for manufacturing porous structure and method for forming pattern'20067,090,784'Method for manufacturing porous structure and method for forming pattern'20066,977,130'Method of manufacturing an electronic circuit and manufacturing apparatus of an electronic circuit'20056,906,423'Mask used for exposing a porous substrate'20056,899,999'Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member'20056,835,889'Passive element component and substrate with built-in passive element'20046,709,806'Method of forming composite member'20046,649,516'Method for manufacturing a composite member from a porous substrate by selectively infiltrating conductive material into the substrate to form via and wiring regions'20036,565,763'Method for manufacturing porous structure and method for forming pattern'20036,565,764'Method of manufacturing a material having a fine structure'20036,465,742'Three dimensional structure and method of manufacturing the same'20026,437,090'Curing catalyst, resin composition, resin-sealed semiconductor device and coating material'20025,998,509'Resin composition and semiconductor device employing the same'19995,912,320'Polyphenylene sulfide resin composition and resin-encapsulated semiconductor device'19995,705,540'Inorganic filler, manufacturing method thereof, and resin composition containing an inorganic filler'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2020Patents assigned to TOSHIBA KK (46)· patent assignee history
1998–2009Based in Funabashi, JP· patent location history
2002–2008Based in Toyko, JP· patent location history
2003–2020Based in Tokyo, JP· patent location history
2012–2015Patents assigned to HOTTA YASUYUKI (10)· patent assignee history
2013–2015Patents assigned to EGUCHI TOMOKO (4)· patent assignee history
2013–2015Patents assigned to SUENAGA SEIICHI (4)· patent assignee history
2013–2015Patents assigned to SUETSUNA TOMOHIRO (4)· patent assignee history
2018–2019Based in Ota, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK461998–2020
HOTTA YASUYUKIself102012–2015
EGUCHI TOMOKO42013–2015
SUENAGA SEIICHI42013–2015
SUETSUNA TOMOHIRO42013–2015
Locations
LocationPatentsSpan
Tokyo, JP352003–2020
Funabashi, JP81998–2009
Ota, JP42018–2019
Toyko, JP22002–2008