Inventor
Yasuyuki Miyamoto
Inventor
Nagareyama, JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices30%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01JElectric discharge tubes or discharge lamps10%
H03MCoding10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
PatentTitleYear
11,043,964Memory system, packet protection circuit, and CRC calculation method20217,923,754'Bipolar transistor'20116,919,274'LSI device etching method and apparatus thereof'20056,424,052'Alignment mark for electron beam lithography'20025,656,515'Method of making high-speed double-heterostructure bipolar transistor devices'19975,625,206'High-speed double-heterostructure bipolar transistor devices'19975,436,096'Method of manufacturing X-ray exposure mask'19955,364,717'Method of manufacturing X-ray exposure mask'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2002Patents assigned to TOKYO INST TECH (3)· patent assignee history
1994–1995Based in Higashikurume, JP· patent location history
1997Patents assigned to LUCENT TECHNOLOGIES INC (2)· patent assignee history
1997–2011Based in Nagareyama, JP· patent location history
2005Patents assigned to HITACHI HIGH TECH CORP (1)· patent assignee history
2005Based in Kudamatsu, JP· patent location history
2011Patents assigned to JAPAN SCIENCE & TECH AGENCY (1)· patent assignee history
2021Patents assigned to KIOXIA CORP (1)· patent assignee history
2021Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO INST TECH | 3 | 1994–2002 |
| LUCENT TECHNOLOGIES INC | 2 | 1997 |
| HITACHI HIGH TECH CORP | 1 | 2005 |
| JAPAN SCIENCE & TECH AGENCY | 1 | 2011 |
| KIOXIA CORP | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nagareyama, JP | 4 | 1997–2011 |
| Higashikurume, JP | 2 | 1994–1995 |
| Kanagawa, JP | 1 | 2021 |
| Kudamatsu, JP | 1 | 2005 |