Inventor

YU-KAI CHEN

Inventor
TW

Overview

28→
Patents
2021–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01LSemiconductor devices16%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H10DInorganic electric semiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
B05BSpraying apparatus3%
G05BControl or regulating systems in general3%
G05DSystems for controlling or regulating non-electric variables3%
A61KPreparations for medical, dental or toiletry purposes2%
B01DSeparation2%
PatentTitleYear
12,576,538Photoresist bottle replacement system202612,372,876Lens adjustment for an edge exposure tool202512,300,542Semiconductor device pre-cleaning202512,300,900Ammonium fluoride pre-clean protection202512,211,747Method of forming contact metal202512,170,214Semiconductor device manufacturing system and method for manufacturing semiconductor device202412,132,344Power system design and control technology202412,126,265Switch mode power supply circuit with high voltage output, and electrostatic spray apparatus and agricultural plant protection apparatus using the same202412,043,668Anti-human CSF-1R antibody and uses thereof202412,046,510Conductive feature formation and structure202412,023,397Scalp protection composition202412,025,533System and method for liquid leak detection202411,969,677Method of using liquid supply system with improved bubble venting capacity202411,915,976Semiconductor device pre-cleaning202411,899,368Manufacturing method of semiconductor device and semiconductor processing system202411,852,979Lens adjustment for an edge exposure tool202311,791,208Method of forming contact metal202311,740,558Photoresist baking apparatus with cover plate having uneven exhaust hole distribution202311,679,510Photoresist bottle replacement system202311,454,891Manufacturing method of semiconductor device and semiconductor processing system202211,392,039Photoresist baking apparatus with cover plate having uneven exhaust hole distribution202211,378,888Lens adjustment for an edge exposure tool202211,373,905Semiconductor device pre-cleaning202211,273,396Liquid supply system with improved bubble venting capacity202211,232,947Ammonium fluoride pre-clean protection202211,232,985Method of forming contact metal202211,199,466System and method for liquid leak detection202111,186,920Apparatus capable of local polishing and plasma-electrolytic polishing system2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (23)· patent assignee history
2021Patents assigned to METAL IND RES & DEV CT (1)· patent assignee history
2021–2026Based in TW· patent location history
2024Patents assigned to CHUNG HSIN ELECTRIC & MACHINERY MFG CORP (1)· patent assignee history
2024Patents assigned to CHUNG HSIN ELECTRIC &MACHINERY MFG CORP (1)· patent assignee history
2024Patents assigned to DEV CT BIOTECHNOLOGY (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD232021–2026
CHUNG HSIN ELECTRIC & MACHINERY MFG CORP12024
CHUNG HSIN ELECTRIC &MACHINERY MFG CORP12024
DEV CT BIOTECHNOLOGY12024
METAL IND RES & DEV CT12021
Locations
LocationPatentsSpan
TW282021–2026