Inventor
Hongjun Zhou
Inventor
Chandler, AZ, US
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Gprimary
C09GPolishing compositions12%
C09KMaterials for miscellaneous applications, not provided for elsewhere12%
H01LSemiconductor devices12%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
B24BMachines, devices, or processes for grinding or polishing11%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds8%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals5%
G09GArrangements or circuits for control of indicating devices using static means to present variable information5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
B82YSpecific uses or applications of nanostructures4%
PatentTitleYear
10,669,449Composite abrasive particles for chemical mechanical planarization composition and method of use thereof202010,421,890Composite particles, method of refining and use thereof201910,418,247Composite abrasive particles for chemical mechanical planarization composition and method of use thereof201910,160,884Metal compound chemically anchored colloidal particles and methods of production and use thereof201810,109,493Composite abrasive particles for chemical mechanical planarization composition and method of use thereof201810,011,741Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof20189,940,294Method, apparatus, and system for configuring high-speed serial bus parameter20189,305,476'Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof'20169,062,230'Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof'20158,859,428'Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof'20148,808,530'Method and apparatus for electrocatalytic amplification on pre-oxidized measuring electrode'20148,318,126'Methods of making metal oxide nanostructures and methods of controlling morphology of same'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2014Patents assigned to ZHOU HONGJUN (2)· patent assignee history
2012–2014Based in Austin, TX, US· patent location history
2014–2019Patents assigned to AIR PROD & CHEM (7)· patent assignee history
2014Patents assigned to BARD ALLEN J (1)· patent assignee history
2014Patents assigned to FAN FU-REN F (1)· patent assignee history
2014–2019Based in Chandler, AZ, US· patent location history
2018–2020Patents assigned to VERSUM MAT US LLC (6)· patent assignee history
2018Based in Nanjing, CN· patent location history
2020Based in Tempe, AZ, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AIR PROD & CHEM | 7 | 2014–2019 |
| VERSUM MAT US LLC | 6 | 2018–2020 |
| ZHOU HONGJUNself | 2 | 2012–2014 |
| BARD ALLEN J | 1 | 2014 |
| FAN FU-REN F | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chandler, AZ, US | 8 | 2014–2019 |
| Austin, Texas, US | 2 | 2012–2014 |
| Tempe, AZ, US | 1 | 2020 |
| Nanjing, CN | 1 | 2018 |