Inventor
Satoru Takaki
Inventor
Yokohama, JP
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material18%
C03CChemical composition of glasses, glazes or vitreous enamels16%
H01JElectric discharge tubes or discharge lamps15%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
Y10TTechnical subjects covered by former us classification11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
H01BCables7%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form4%
C23FNon-mechanical removal of metallic material from surface4%
G02BOptical elements, systems or apparatus4%
PatentTitleYear
8,425,711'Glass substrate with protective glass, and process for producing display device using glass substrate with protective glass'20138,418,359'Method for manufacturing circuit pattern-provided substrate'20138,323,856'Mask blanks'20127,846,641'Glass substrate having circuit pattern and process for producing the same'20107,772,778'Method for forming electrodes and/or black stripes for plasma display substrate'20106,829,084'Ultraviolet and vacuum ultraviolet antireflection substrate'20046,635,155'Method for preparing an optical thin film'20036,628,456'Ultraviolet and vacuum ultraviolet antireflection substrate'20036,533,904'Oxide film, laminate and methods for their production'20036,468,403'Methods for producing functional films'20026,465,117'Transparent conductive film and process for forming a transparent electrode'20026,329,044'Transparent conductive film and method of making the film'20016,221,520'Transparent conductive film and process for forming a transparent electrode'20016,110,328'Method of an apparatus for sputtering'20005,942,090'Methods of producing a laminate'19995,660,700'Sputter coating power processing portion'19975,009,922'Method of forming a transparent conductive film'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2013Patents assigned to ASAHI GLASS CO LTD (17)· patent assignee history
1991–2010Based in Yokohama, JP· patent location history
2004Based in Kanagawa, JP· patent location history
2010–2013Based in Tokyo, JP· patent location history
2012–2013Patents assigned to TAKAKI SATORU (3)· patent assignee history
2012Patents assigned to AKAO YASUHIKO (1)· patent assignee history
2013Patents assigned to EBATA KENICHI (1)· patent assignee history
2013Patents assigned to HIGUCHI TOSHIHIKO (1)· patent assignee history
2013Based in Chiyoda-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASAHI GLASS CO LTD | 17 | 1991–2013 |
| TAKAKI SATORUself | 3 | 2012–2013 |
| AKAO YASUHIKO | 1 | 2012 |
| EBATA KENICHI | 1 | 2013 |
| HIGUCHI TOSHIHIKO | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 12 | 1991–2010 |
| Tokyo, JP | 3 | 2010–2013 |
| Chiyoda-ku, JP | 1 | 2013 |
| Kanagawa, JP | 1 | 2004 |