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Inventor

Reijiro Sato

Inventor
Fuji, JP

Overview

2→
Patents
1987–1994
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
5,336,585'Photosensitive resin composition for use in forming a relief structure'19944,716,094'Photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–1994Patents assigned to ASAHI CHEMICAL IND (2)· patent assignee history
1987–1994Based in Fuji, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASAHI CHEMICAL IND21987–1994
Locations
LocationPatentsSpan
Fuji, JP21987–1994