Inventor
SANGITA KUMARI
Inventor
US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices46%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1046%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
12,482,702Wet etch process and methods to form air gaps between metal interconnects202512,243,749Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrate202512,148,624Wet etch process and method to control fin height and channel area in a fin field effect transistor (FinFET)202412,148,625Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrate202412,100,598Methods for planarizing a substrate using a combined wet etch and chemical mechanical polishing (CMP) process202412,100,599Wet etch process and method to provide uniform etching of material formed within features having different critical dimension (CD)2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2025Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2024–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2024–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 6 | 2024–2025 |