LexDanaLexDanabeta
Inventor

Doria W. Fan

Inventor
San Francisco, CA, US

Overview

2→
Patents
2000–2001
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material50%
C30BSingle-crystal growth50%
PatentTitleYear
6,254,686'Vented lower liner for heating exhaust gas from a single substrate reactor'20016,153,260'Method for heating exhaust gas in a substrate reactor'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2000–2001Based in San Francisco, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC22000–2001
Locations
LocationPatentsSpan
San Francisco, California, US22000–2001