Inventor
Warren T. Yu
Inventor
San Jose, CA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
PatentTitleYear
6,482,573'Exposure correction based on reflective index for photolithographic process control'20026,345,209'Method of using critical dimension mapping to qualify a new integrated circuit manufacturing process'20026,345,211'Method of using critical dimension mapping to optimize speed performance of microprocessor produced using an integrated circuit manufacturing process'20026,345,210'Method of using critical dimension mapping to qualify a reticle used in integrated circuit fabrication'20026,238,936'Method of using critical dimension mapping to qualify a new integrated circuit fabrication etch process'20016,215,127'Method of using critical dimension mapping to qualify a new integrated circuit fabrication tool set'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2002Patents assigned to ADVANCED MICRO DEVICES INC (6)· patent assignee history
2001–2002Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ADVANCED MICRO DEVICES INC | 6 | 2001–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 6 | 2001–2002 |