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Inventor

Patrick WILKE

Inventor
DE

Overview

2→
Patents
2024
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
C11DDetergent compositions20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
12,146,125Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below202411,970,647Composition, its use and a process for selectively etching silicon-germanium material2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024Patents assigned to BASF SE (2)· patent assignee history
2024Based in DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BASF SE22024
Locations
LocationPatentsSpan
DE22024