Inventor

Shin-ya Nakafuji

Inventor

Tokyo, JP

Overview

2014–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%

H01LSemiconductor devices16%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%

C09DCoating compositions, e.g. paints, varnishes or lacquers9%

C07CAcyclic or carbocyclic compounds8%

C08LCompositions of macromolecular compounds7%

B44CProducing decorative effects4%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2014–2021Patents assigned to JSR CORP (15)· patent assignee history

2014–2015Patents assigned to MINEGISHI SHIN-YA (2)· patent assignee history

2014–2015Patents assigned to NAKAFUJI SHIN-YA (2)· patent assignee history

2014–2021Based in Tokyo, JP· patent location history

2015Patents assigned to KIMURA TORU (1)· patent assignee history

2015Patents assigned to MURAKAMI SATORU (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Tokyo, JP	15	2014–2021