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Inventor

JAEKYUNG PARK

Inventor
KR

Overview

2→
Patents
2023–2025
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
12,455,510Substrate processing apparatus and method of manufacturing semiconductor device using the same202511,726,406Method of coating a photoresist and apparatus for performing the same2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2023–2025Patents assigned to SEOUL NAT UNIV R&DB FOUNDATION (2)· patent assignee history
2023Patents assigned to HEO SEOK (1)· patent assignee history
2023Patents assigned to KIM DONGWOOK (1)· patent assignee history
2023Patents assigned to KIM HO YOUNG (1)· patent assignee history
2023–2025Based in KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD22023–2025
SEOUL NAT UNIV R&DB FOUNDATION22023–2025
HEO SEOK12023
KIM DONGWOOK12023
KIM HO YOUNG12023
Locations
LocationPatentsSpan
KR22023–2025