Inventor
Kuo-Yao Cho
Inventor
Taichung, TW
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
F15BSystems acting by means of fluids in general11%
H10DInorganic electric semiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
PatentTitleYear
8,658,051'Lithography resolution improving method'20147,998,660'Exposure method'20117,915,133'Method of forming a trench capacitor'20117,892,712'Exposure method'20117,799,512'Method for forming ring pattern'20107,776,496'Photomask layout pattern'20107,713,882'Patterning method for a semiconductor substrate'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2014Patents assigned to NANYA TECHNOLOGY CORP (7)· patent assignee history
2010–2011Based in Taichung, TW· patent location history
2010–2011Based in Taipei, TW· patent location history
2014Patents assigned to CHO KUO-YAO (1)· patent assignee history
2014Patents assigned to LAY CHAO-WEN (1)· patent assignee history
2014Patents assigned to SHIH CHIANG-LIN (1)· patent assignee history
2014Patents assigned to WANG YA-CHIH (1)· patent assignee history
2014Based in Da-an Shiang, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NANYA TECHNOLOGY CORP | 7 | 2010–2014 |
| CHO KUO-YAOself | 1 | 2014 |
| LAY CHAO-WEN | 1 | 2014 |
| SHIH CHIANG-LIN | 1 | 2014 |
| WANG YA-CHIH | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taichung, TW | 4 | 2010–2011 |
| Taipei, TW | 2 | 2010–2011 |
| Da-an Shiang, TW | 1 | 2014 |