Inventor

Martijn Constant Van Beurden

Inventor
Eindhoven, NL

Overview

5→
Patents
2014–2017
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G01NInvestigating or analysing materials by determining their chemical or physical properties27%
G01BMeasuring length, thickness or similar linear dimensions13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G06FElectric digital data processing7%
H01LSemiconductor devices7%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2017Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2014–2015Patents assigned to VAN BEURDEN MARTIJN CONSTANT (4)· patent assignee history
2014Patents assigned to DIRKS REMCO (2)· patent assignee history
2014Patents assigned to SETIJA IRWAN DANI (2)· patent assignee history
2014Patents assigned to VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA (1)· patent assignee history
2014–2015Based in Eindhoven, NL· patent location history
2017Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52014–2017
VAN BEURDEN MARTIJN CONSTANTself42014–2015
DIRKS REMCO22014
SETIJA IRWAN DANI22014
VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA12014
Locations
LocationPatentsSpan
Eindhoven, NL42014–2015
Veldhoven, NL12017