Inventor
TZA-JING GUNG
Inventor
US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
H01LSemiconductor devices19%
C23CCoating metallic material18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H10BElectronic memory devices7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
G06FElectric digital data processing4%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
PatentTitleYear
12,555,741Magnetic housing systems202612,542,256Batch processing chambers for plasma-enhanced deposition202612,463,052Directional selective junction clean with field polymer protections202512,100,576Metal oxide preclean chamber with improved selectivity and flow conductance202412,027,354Cleaning of SIN with CCP plasma or RPS clean202411,948,846Analyzing in-plane distortion202411,915,918Cleaning of sin with CCP plasma or RPS clean202411,898,236Methods and apparatus for processing a substrate202411,637,043Analyzing in-plane distortion202311,637,107Silicon-containing layer for bit line resistance reduction202311,626,410Silicon-containing layer for bit line resistance reduction202311,587,764Magnetic housing systems202311,562,909Directional selective junction clean with field polymer protections202311,339,475Film stack overlay improvement202211,289,312Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability202211,276,569On stack overlay improvement for 3D NAND202211,152,248Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (17)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 17 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 17 | 2021–2026 |