Inventor
Dong-Chul Seo
Inventor
Chungcheongnam-do, KR
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
C07CAcyclic or carbocyclic compounds10%
C07DHeterocyclic compounds7%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
C08LCompositions of macromolecular compounds3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
Y02PClimate change mitigation technologies in the production or processing of goods3%
PatentTitleYear
9,321,875'Additive for resist and resist composition comprising same'20168,865,919'Sulfonium compound, photo-acid generator, and method for manufacturing the same'20148,765,358'Water-soluble resin composition and method of forming fine patterns by using the same'20148,617,789'Photoacid generator, method for producing the same, and resist composition comprising the same'20137,326,520'Copolymer of alicyclic olefin having secondary hydroxyl group and acryl compound, and chemically amplified resist composition containing the same'20087,285,373'Polymer and chemically amplified resist composition containing the same'20076,369,143'Polymer for radiation-sensitive resist and resist composition containing the same'20026,358,666'Chemically amplified resist composition containing norbornane type low molecular additive'20026,268,106'Chemically amplified positive photoresist composition'20016,146,810'Resist polymer and chemical amplified resist composition containing the same'20006,111,143'Sulfonium salt and its manufacturing method'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2016Patents assigned to KOREA KUMHO PETROCHEM CO LTD (10)· patent assignee history
2000Patents assigned to KOREA KUMBO PETROCHEMICAL CO L (1)· patent assignee history
2000–2002Based in Taejeon, KR· patent location history
2002Based in Taejon, KR· patent location history
2007Based in Cheunan, KR· patent location history
2008–2014Based in Chungcheongnam-do, KR· patent location history
2013–2014Patents assigned to SEO DONG CHUL (2)· patent assignee history
2013Patents assigned to KIM TAE GON (1)· patent assignee history
2014Patents assigned to JOO HYUN SANG (1)· patent assignee history
2016Based in Cheonan-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KOREA KUMHO PETROCHEM CO LTD | 10 | 2000–2016 |
| SEO DONG CHULself | 2 | 2013–2014 |
| JOO HYUN SANG | 1 | 2014 |
| KIM TAE GON | 1 | 2013 |
| KOREA KUMBO PETROCHEMICAL CO L | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chungcheongnam-do, KR | 4 | 2008–2014 |
| Taejeon, KR | 4 | 2000–2002 |
| Cheonan-si, KR | 1 | 2016 |
| Cheunan, KR | 1 | 2007 |
| Taejon, KR | 1 | 2002 |